Patents by Inventor Benjamin Kam

Benjamin Kam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220299877
    Abstract: The present disclosure relates to post-application treatment of a radiation-sensitive film to provide a hardened resist film. In some instances, such films can be used to form a pattern by a positive tone wet development process.
    Type: Application
    Filed: October 8, 2020
    Publication date: September 22, 2022
    Applicant: Lam Research Corporation
    Inventors: Timothy William Weidman, Katie Lynn Nardi, Dries Dictus, Benjamin Kam, Chenghao Wu, Eric Calvin Hansen, Nizan Kenane, Kevin Li Gu
  • Patent number: 8592804
    Abstract: An organic optoelectronic device and a method for manufacturing the same are disclosed. In one aspect, the device has a stack of layers. The stack includes a buffer layer and a first organic semiconductor layer adjacent to the buffer layer at a first side of the buffer layer. The buffer layer includes at least one transition metal oxide doped with a metal.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: November 26, 2013
    Assignee: IMEC
    Inventors: Barry Rand, David Cheyns, Benjamin Kam
  • Publication number: 20100301320
    Abstract: An organic optoelectronic device and a method for manufacturing the same are disclosed. In one aspect, the device has a stack of layers. The stack includes a buffer layer and a first organic semiconductor layer adjacent to the buffer layer at a first side of the buffer layer. The buffer layer includes at least one transition metal oxide doped with a metal.
    Type: Application
    Filed: May 27, 2010
    Publication date: December 2, 2010
    Applicant: IMEC
    Inventors: Barry Rand, David Cheyns, Benjamin Kam