Abstract: A mask adapted for delivering pressurised air to a user, the mask comprising: an endoskeleton of a first resilient material encapsulated to a lamina of a second resilient material forming a mask body with a cavity. The second resilient material is more flexible than the first resilient material. The lamina having a face contactable skirt portion extending away from the endoskeleton perimeter. The skirt portion comprises an outer layer and an inner layer for providing variable contoured thickness to outer lamina segments of the face contactable portion. The face contactable skirt portion having a flexible cavity edge defining a cavity opening for receiving a nasal region. The endoskeleton and lamina has an aperture adapted to connect to an air delivery tube; the thinner flexible cavity edge is adapted to wrap into the cavity, when wrapped, the contoured thicker lamina segments wraps and seals around the sides of the nose.

Abstract: A plasma-enhanced chemical vapor deposition coating system includes a deposition chamber including one or more zones of processing, an electrode centrally located within the deposition chamber, wherein the electrode forms a central axis in the deposition chamber, and a carousel configured to carry at least one substrate. The carousel is configured to move axially in a direction along the central axis from a first end of the deposition chamber to a second end of the deposition chamber. The carousel is further configured to rotate around the central axis such that the substrate is oriented in a plurality of different directions relative to the central axis.

Abstract: A method for depositing coating onto a substrate includes providing a monomer for creation of a protective coating on a substrate, energizing the monomer with a plasma generation system, and polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.

Abstract: A method for depositing coating onto a substrate includes providing a monomer for creation of a protective coating on a substrate, energizing the monomer with a plasma generation system, and polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.

Abstract: A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate.

Abstract: A plasma-enhanced chemical vapor deposition coating system includes a deposition chamber including one or more zones of processing, an electrode centrally located within the deposition chamber, wherein the electrode forms a central axis in the deposition chamber, and a carousel configured to carry at least one substrate. The carousel is configured to move axially in a direction along the central axis from a first end of the deposition chamber to a second end of the deposition chamber. The carousel is further configured to rotate around the central axis such that the substrate is oriented in a plurality of different directions relative to the central axis.

Abstract: A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate. The system further includes a masking fixture including at least one opening and configured to shield areas of the substrate from plasma ashing, and further including a gasket between the masking fixture and the substrate.

Abstract: A method for depositing coating onto a substrate includes providing a monomer for creation of a protective coating on a substrate, energizing the monomer with a plasma generation system, and polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.

Abstract: A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate. The plasma reaction chamber comprises a sensor or analyzer configured to determine when to stop plasma ashing the substrate.

Abstract: A deposition system includes a multipurpose deposition chamber, a pre-treatment source and a post-treatment source. The multipurpose deposition chamber is configured to deposit parylene on a plurality of electronic devices. The multipurpose deposition chamber is configured to process pre-treatment of the plurality of electronic devices prior to deposition of the parylene. The multipurpose deposition chamber is configured to process post-treatment of the plurality of electronic devices after deposition of the parylene.

Abstract: A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate.

Abstract: A system for plasma etching or ashing a coating on a substrate includes a plasma chamber, a second electrode, a plasma source coupled to the plasma chamber, a substrate including a coating, and a plasma mask including at least one aperture. The plasma chamber includes a first electrode. The plasma mask is configured to cover the substrate while exposing selected surfaces of the substrate and coating through the at least one aperture. The first electrode and the second electrode are configured to initiate and maintain a plasma within the plasma chamber. The plasma source includes a gas.

Abstract: An instant beverage is made by forming a mixture of an aromatic food condensate and at least about 10% of beverage solubles, freezing and then grinding the mixture to form frozen particles. The frozen particles are mixed with additional cold, dry beverage solubles to form a mixture comprising from about 0.2% to about 15% of frozen particles. This mixture is then warmed to melt the frozen particles and incorporate the aroma and flavor of the condensate in a stable form into the beverage solubles.