Patents by Inventor Benjamin McMorran

Benjamin McMorran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device and method for creating Gaussian aberration-corrected electron beams
    Patent number: 9240255
    Abstract: Electron beam phase gratings have phase profiles that produce a diffracted beam having a Gaussian or other selected intensity profile. Phase profiles can also be selected to correct or compensate electron lens aberrations. Typically, a low diffraction order produces a suitable phase profile, and other orders are discarded.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: January 19, 2016
    Assignees: University of Oregon, The United States of America, as represented by the Secretary of Commerce, The Regents of the University of California
    Inventors: Benjamin McMorran, Martin Linck
  • DEVICE AND METHOD FOR CREATING GAUSSIAN ABERRATION-CORRECTED ELECTRON BEAMS
    Publication number: 20140252228
    Abstract: Electron beam phase gratings have phase profiles that produce a diffracted beam having a Gaussian or other selected intensity profile. Phase profiles can also be selected to correct or compensate electron lens aberrations. Typically, a low diffraction order produces a suitable phase profile, and other orders are discarded.
    Type: Application
    Filed: March 6, 2014
    Publication date: September 11, 2014
    Inventors: Benjamin McMorran, Martin Linck, Peter Moeck
  • System and method for producing and using multiple electron beams with quantized orbital angular momentum in an electron microscope
    Patent number: 8680488
    Abstract: A system and method for using electron beams with engineered phase dislocations as scanned probes in electron probe beam instruments such as scanning transmission electron microscopes. These types of electron beams have unique properties and can provide better information about a specimen than conventional electron beams. Phase dislocations may be created based on a pattern disposed on a nanoscale hologram, which may be placed in the electron optical column of the electron probe beam instrument. When an electron beam from the instrument is directed onto the hologram, phase dislocations may be imprinted onto the electron beam when electrons are diffracted from these holograms. For example, electron probe beams with spiral phase dislocations may occur. These spiral phase dislocations are formed using a hologram with a fork-patterned grating. Spiral phase dislocations may be used to provide magnetic contrast images of a specimen.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: March 25, 2014
    Inventor: Benjamin McMorran
  • SYSTEM AND METHOD FOR PRODUCING AND USING MULTIPLE ELECTRON BEAMS WITH QUANTIZED ORBITAL ANGULAR MOMENTUM IN AN ELECTRON MICROSCOPE
    Publication number: 20120153144
    Abstract: A system and method for using electron beams with engineered phase dislocations as scanned probes in electron probe beam instruments such as scanning transmission electron microscopes. These types of electron beams have unique properties and can provide better information about a specimen than conventional electron beams. Phase dislocations may be created based on a pattern disposed on a nanoscale hologram, which may be placed in the electron optical column of the electron probe beam instrument. When an electron beam from the instrument is directed onto the hologram, phase dislocations may be imprinted onto the electron beam when electrons are diffracted from these holograms. For example, electron probe beams with spiral phase dislocations may occur. These spiral phase dislocations are formed using a hologram with a fork-patterned grating. Spiral phase dislocations may be used to provide magnetic contrast images of a specimen.
    Type: Application
    Filed: February 14, 2012
    Publication date: June 21, 2012
    Inventor: Benjamin McMorran