Patents by Inventor Benjamin Odarkwei Mills-Lamptey

Benjamin Odarkwei Mills-Lamptey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8772174
    Abstract: A method for treating silicon to form pillars, especially for use as the active anode material in Li-ion batteries, is disclosed. The process is simple to operate on a commercial scale since it uses a solution containing only a small number of ingredients whose concentration needs to be controlled and it can be cheaper to operate than previous processes. The solution includes: 0.01 to 5M HF 0.002 to 0.2M of metal ions capable of nucleating on and forming a porous layer comprising regions of elemental metal on the silicon surface; 0.001 to 0.7M of an oxidant selected from the group O2, O3, H2O2, the acid, ammonium or alkali metal salt of NO3?, S2O82?, NO2?, B4O72? and ClO4? or a mixture thereof. The treated silicon is suitably removed from the solution.
    Type: Grant
    Filed: April 8, 2011
    Date of Patent: July 8, 2014
    Assignee: Nexeon Ltd.
    Inventors: Mino Green, Feng-Ming Liu, Yuxiong Jiang, Valerie Elizabeth Dawn Stevens, Benjamin Odarkwei Mills-Lamptey
  • Publication number: 20130122717
    Abstract: A method for treating silicon to form pillars, especially for use as the active anode material in Li-ion batteries, is disclosed. The process is simple to operate on a commercial scale since it uses a solution containing only a small number of ingredients whose concentration needs to be controlled and it can be cheaper to operate than previous processes. The solution includes: 0.01 to 5M HF 0.002 to 0.2M of metal ions capable of nucleating on and forming a porous layer comprising regions of elemental metal on the silicon surface; 0.001 to 0.7M of an oxidant selected from the group O2, O3, H2O2, the acid, ammonium or alkali metal salt of NO3?, S2O82?, NO2?, B4O72? and ClO4? or a mixture thereof. The treated silicon is suitably removed from the solution.
    Type: Application
    Filed: April 8, 2011
    Publication date: May 16, 2013
    Applicant: NEXEON LIMITED
    Inventors: Mino Green, Feng-Ming Liu, Yuxiong Jiang, Valerie Elizabeth Dawn Stevens, Benjamin Odarkwei Mills-Lamptey