Patents by Inventor Benjamin Patrick Bayer

Benjamin Patrick Bayer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low pressure fluctuation apparatuses for blending fluids, and methods of using the same
    Patent number: 11266959
    Abstract: A low pressure fluctuation control apparatus comprises a liquid recirculation loop comprising a dip tube, a diaphragm or bellows type pump, a first regulator, a first flow meter, a junction, and a return tube. A back pressure controller is located in the return tube. In addition, the apparatus comprises a material supply line fluidly connected the liquid recirculation loop via the junction. A flow control system is located in the material supply line. The recirculation loop draws liquid from a supply container by the dip tube, and returns a portion of the liquid to the supply container by the return tube. The backpressure flow controller regulates the flow rate of the liquid, thereby steadying fluctuations in the liquid being supplied.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: March 8, 2022
    Assignee: Versum Materials US, LLC
    Inventors: Benjamin Patrick Bayer, Laura Suk Chong Chan, Fady Khalil Ereifej, Daniel Valentin Roybal
  • Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
    Patent number: 10562151
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: February 18, 2020
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer
  • Slurry Supply and/or Chemical Blend Supply Apparatuses, Processes, Methods of Use and Methods of Manufacture
    Publication number: 20180021921
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Application
    Filed: September 6, 2017
    Publication date: January 25, 2018
    Applicant: VERSUM MATERIALS US, LLC
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer
  • Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
    Patent number: 9770804
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: September 26, 2017
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer
  • LOW PRESSURE FLUCTUATION FLOW CONTROL APPARATUS AND METHOD
    Publication number: 20170259226
    Abstract: This invention provides apparatuses and methods to supply a steady volume of liquid with low pressure fluctuation that can be used to form a liquid blend or to supply other equipment or tools. The invention uses a flow controller that controls the flow rate for liquid that is fed to a liquid supply pipe from a recirculation loop that is connected thereto, the recirculation loop has a dip tube for insertion into a liquid supply container, pump, and liquid backpressure control device.
    Type: Application
    Filed: October 8, 2015
    Publication date: September 14, 2017
    Inventors: Benjamin Patrick Bayer, Laura Suk Chong Chan, Fady Khalil Ereifej, Daniel Valentin Roybal
  • Slurry Supply and/or Chemical Blend Supply Apparatuses, Processes, Methods of Use and Methods of Manufacture
    Publication number: 20140261824
    Abstract: A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
    Type: Application
    Filed: March 18, 2014
    Publication date: September 18, 2014
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Gary Allen Byers, Bela Derecskei, Benjamin Patrick Bayer