Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: A method of three-dimensional stereolithography printing a thiourethane polymer part using the vat resin. Adding a resin to a vat of a three-dimensional stereolithography printer, the resin a liquid mixture including: a first type of monomer including two or more thiol functional groups, a second type of monomer including two or more isocyanate functional groups, a photolatent base, an anionic step-growth polymerization reaction inhibitor and a light absorber. The photolatent base is decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7. The anionic step-growth polymerization reaction inhibitor has an acidic group configured to form an acid-base pair with the non-nucleophillic base. The light absorber has an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure.

Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: an acrylate oligomer; a methacrylate monomer; and a thiol wherein the resin may be configured to react by exposure to light to form a cured material. The resin may further comprise one or more oligomeric additives. For example, polyether oligomeric additives such as polytetrahydrofuran.

Abstract: A vat resin for three-dimensional stereolithography printing of a thiourethane polymer part comprising a liquid mixture including a first type of monomer, a second type of monomer, a photolatent base decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7, an anionic step-growth polymerization reaction inhibitor having an acidic group configured to form an acid-base pair with the non-nucleophillic base and a light absorber having an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure. Methods of preparing the vat resin and three-dimensional stereolithography printing a thiourethane polymer part using the vat resin are also disclosed.

Abstract: A method of three-dimensional stereolithography printing a thiourethane polymer part using the vat resin. Adding a resin to a vat of a three-dimensional stereolithography printer, the resin a liquid mixture including: a first type of monomer including two or more thiol functional groups, a second type of monomer including two or more isocyanate functional groups, a photolatent base, an anionic step-growth polymerization reaction inhibitor and a light absorber. The photolatent base is decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7. The anionic step-growth polymerization reaction inhibitor has an acidic group configured to form an acid-base pair with the non-nucleophillic base. The light absorber has an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: A semi-crystalline thiourethane polymer. The semi-crystalline thiourethane polymer comprises a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages. Each of the first type of monomer includes two or more thiol functional groups and each of the second type of monomer includes two or more isocyanate functional groups. The first and second types of monomers are polymerized together in an anionic step-growth polymerization reaction that is catalyzed by a non-nucleophillic base having a pKa greater than 7, produced by photo-initiated decomposition of a photolatent base. A method of synthesizing, and polymer jetting and stereolithography methods of manufacturing a polymer part, are also disclosed.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: The present disclosure relates to sealed isocyanate resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: a blocked isocyanate; at least one monomer or oligomer; and a multifunctional nucleophile.

Abstract: A semi-crystalline thiourethane polymer. The semi-crystalline thiourethane polymer comprises a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages. Each of the first type of monomer includes two or more thiol functional groups and each of the second type of monomer includes two or more isocyanate functional groups. The first and second types of monomers are polymerized together in an anionic step-growth polymerization reaction that is catalyzed by a non-nucleophillic base having a pKa greater than 7, produced by photo-initiated decomposition of a photolatent base. A method of synthesizing, and polymer jetting and stereolithography methods of manufacturing a polymer part, are also disclosed.

Abstract: A thermoplastic thiourethane polymer comprising a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages. The first type of monomer includes two or more thiol functional groups and the type of monomer includes two or more isocyanate functional groups. The first and second types of monomers are polymerized together in an anhydrous aprotic solvent-dissolved anionic step-growth polymerization reaction that is catalyzed by a non-nucleophillic base having a pKa greater than 7.

Abstract: A vat resin for three-dimensional stereolithography printing of a thiourethane polymer part comprising a liquid mixture including a first type of monomer, a second type of monomer, a photolatent base decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7, an anionic step-growth polymerization reaction inhibitor having an acidic group configured to form an acid-base pair with the non-nucleophillic base and a light absorber having an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure. Methods of preparing the vat resin and three-dimensional stereolithography printing a thiourethane polymer part using the vat resin are also disclosed.

Abstract: A melt-processable thermoset polymer comprising monomers cross-linked together by furan-maleimide Diels Alder adduct covalent bonds. At least about 1 percent of the furan-maleimide Diels Alder adduct covalent bonds of the polymer are de-cross-linked by a retro Diels Alder reaction at a temperature in a range from about 90° C. and less than about 300° C. A method of synthesizing, a filament fabrication printer for printing, and a method of printing, the melt-processable thermoset polymer are also disclosed.

Abstract: A semi-crystalline thiourethane polymer. The semi-crystalline thiourethane polymer comprises a sequential chain of a first type of monomer covalently bonded to a second type of monomer via thiourethane linkages. Each of the first type of monomer includes two or more thiol functional groups and each of the second type of monomer includes two or more isocyanate functional groups. The first and second types of monomers are polymerized together in an anionic step-growth polymerization reaction that is catalyzed by a non-nucleophillic base having a pKa greater than 7, produced by photo-initiated decomposition of a photolatent base. A method of synthesizing, and polymer jetting and stereolithography methods of manufacturing a polymer part, are also disclosed.

Abstract: A method of poling an organic polymeric electro-optic material. The method includes doping the organic polymeric electro-optic material with nanoparticles. The method also includes heating the organic polymeric electro-optic material to a poling temperature. The method also includes poling the organic polymeric electro-optic material by applying an electric field across the organic polymeric electro-optic material.

Abstract: A method of poling an organic polymeric electro-optic material. The method includes doping the organic polymeric electro-optic material with nanoparticles. The method also includes heating the organic polymeric electro-optic material to a poling temperature. The method also includes poling the organic polymeric electro-optic material by applying an electric field across the organic polymeric electro-optic material.

Abstract: Embodiments of the invention is directed to a manufacturing process to mold and cast custom softening polymers into complex shaped devices, said process comprising the steps of: creating a 3D mold or shell; injecting the shell with a polymer or pre-polymer; cooling or curing the polymer in a short period of time; and forming a device.