Patents by Inventor Benjamin Rattle

Benjamin Rattle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for enhanced light trapping in solar cells
    Patent number: 9583651
    Abstract: Methods for improving the light trapping characteristics of crystalline silicon solar cells are provided. In one embodiment, the backside surface of a crystalline silicon solar cell substrate is textured with a pulsed laser beam. The textured backside surface of the crystalline silicon solar cell substrate is then annealed to remove damage from the laser texturization process.
    Type: Grant
    Filed: December 26, 2012
    Date of Patent: February 28, 2017
    Assignee: Solexel, Inc.
    Inventors: Mehrdad M. Moslehi, Virendra V. Rana, Solene Coutant, Heather Deshazer, Pranav Anbalagan, Benjamin Rattle
  • ANNEALING FOR DAMAGE FREE LASER PROCESSING FOR HIGH EFFICIENCY SOLAR CELLS
    Publication number: 20160336473
    Abstract: Annealing solutions providing damage-free laser patterning utilizing auxiliary heating to anneal laser damaged ablation regions are provided herein. Ablation spots on an underlying semiconductor substrate are annealed during or after pulsed laser ablation patterning of overlying transparent passivation layers.
    Type: Application
    Filed: December 14, 2015
    Publication date: November 17, 2016
    Inventors: Virendra V. Rana, Mehrdad M. Moslehi, Pawan Kapur, Benjamin Rattle, Heather Deshazer, Solene Coutant, Swaroop Kommera
  • Annealing for damage free laser processing for high efficiency solar cells
    Patent number: 9214585
    Abstract: Annealing solutions providing damage-free laser patterning utilizing auxiliary heating to anneal laser damaged ablation regions are provided herein. Ablation spots on an underlying semiconductor substrate are annealed during or after pulsed laser ablation patterning of overlying transparent passivation layers.
    Type: Grant
    Filed: April 29, 2014
    Date of Patent: December 15, 2015
    Assignee: Solexel, Inc.
    Inventors: Virendra V. Rana, Mehrdad M. Moslehi, Pawan Kapur, Benjamin Rattle, Heather Deshazer, Solene Coutant
  • ANNEALING FOR DAMAGE FREE LASER PROCESSING FOR HIGH EFFICIENCY SOLAR CELLS
    Publication number: 20150056742
    Abstract: Annealing solutions providing damage-free laser patterning utilizing auxiliary heating to anneal laser damaged ablation regions are provided herein. Ablation spots on an underlying semiconductor substrate are annealed during or after pulsed laser ablation patterning of overlying transparent passivation layers.
    Type: Application
    Filed: April 29, 2014
    Publication date: February 26, 2015
    Applicant: Solexel, Inc.
    Inventors: Virendra V. Rana, Mehrdad M. Moslehi, Pawan Kapur, Benjamin Rattle, Heather Deshazer, Solene Coutant