Abstract: Integrated substrate processing systems are disclosed that are able to achieve high-volume processing of substrates (e.g., greater than 120 substrates per hour) using environmentally sensitive processes and/or tools, such as photolithography processes and/or tools. In some embodiments, for example, the integrated substrate processing system may include an EFEM and a processing tool enclosure that are coupled together to form an integrated processing environment. The integrated substrate processing system may operate to maintain substantially uniform conditions (e.g., at a uniform temperature and relative humidity) throughout the integrated environment, and in some embodiments, may utilize an external air source, such as a remote air module (RAM), in order to do so. In some embodiments, high-volume processing of substrates may be further facilitated by employing specialized substrate handling robots and/or specially adapting the EFEM and/or processing tool enclosure.

Abstract: The disclosure describes devices and systems for a seal, and methods for using said seal. A seal includes a base portion configured to couple to a groove formed by a first surface of a first component. The base portion includes a notch in a bottom side of the base portion configured to cause the base portion to laterally flex responsive to an installation force. The seal further includes a sealing portion extending from the base portion. The sealing portion is configured to create an airtight seal between the first component and a sealing surface of a second component responsive to an application of a threshold sealing force against the sealing portion.

Abstract: In an embodiment, the optoelectronic semiconductor component (1) comprises a semiconductor layer sequence (2) with an active zone (22) for generating a radiation. On an bottom side (20) of the semiconductor layer sequence (2) there is an electrically insulating separation layer (3) with several openings (32). An adhesion-promoting layer (4) is located next to the openings (32) on a side of the separation layer (3) facing away from the semiconductor layer sequence (2). A continuous metallization layer (5) is located on a side of the adhesion-promoting layer (4) facing away from the semiconductor layer sequence (2). The semiconductor layer sequence (2) is electrically contacted in the openings (32) directly by the metallization layer (5). The metallization layer (5) and the openings (32) are spaced from the active zone (22) in the direction perpendicular to the separation layer (3).

Abstract: An equipment front end module (EFEM) having walls, a first wall including one or more load ports and an EFEM chamber formed between the walls. The EFEM further includes an upper plenum at a top of the EFEM and including an opening into the EFEM chamber. Ducts provide a return gas flow path enabling recirculation of gas from the EFEM chamber to the upper plenum, the ducts proximate the one or more load ports. The one or more ducts includes flow elements configured to cause a low pressure condition at a location of the one or more load ports.

Abstract: A substrate processing system for an electronic device manufacturing system can include a factory interface forming an interior volume, and a partition disposed in the factory interface. The partition can divide the interior volume into a first factory interface chamber forming a second interior volume, and a second factory interface chamber forming a third interior volume. The partition can be configured to provide a first sealed environment in the first factory interface chamber and a second sealed environment in the second factory interface chamber.

Abstract: A substrate flipping device includes a substrate securing assembly, a gripping actuator, and a rotary actuator. The gripping actuator is configured to pneumatically cause the substrate securing assembly to be in an open position to receive a substrate and configured to pneumatically cause the substrate securing assembly to be in a closed position to secure the substrate. The rotary actuator is configured to pneumatically cause the substrate securing assembly to rotate to a flipped position and to pneumatically rotate to a non-flipped position.

Abstract: A substrate flipping device includes a substrate securing assembly, a gripping actuator, and a rotary actuator. The gripping actuator is configured to pneumatically cause the substrate securing assembly to be in an open position to receive a substrate and configured to pneumatically cause the substrate securing assembly to be in a closed position to secure the substrate. The rotary actuator is configured to pneumatically cause the substrate securing assembly to rotate to a flipped position and to pneumatically rotate to a non-flipped position.

Abstract: In an embodiment, the optoelectronic semiconductor component (1) comprises a semiconductor layer sequence (2) with an active zone (22) for generating a radiation. On an bottom side (20) of the semiconductor layer sequence (2) there is an electrically insulating separation layer (3) with several openings (32). An adhesion-promoting layer (4) is located next to the openings (32) on a side of the separation layer (3) facing away from the semiconductor layer sequence (2). A continuous metallization layer (5) is located on a side of the adhesion-promoting layer (4) facing away from the semiconductor layer sequence (2). The semiconductor layer sequence (2) is electrically contacted in the openings (32) directly by the metallization layer (5). The metallization layer (5) and the openings (32) are spaced from the active zone (22) in the direction perpendicular to the separation layer (3).

Abstract: Substrate supports for use in process chambers having limited physical space for configuring chamber components are disclosed. In some embodiments, a substrate support may include a body having a support surface; a utilities feed coupled to the body and comprising a second portion coupled to and extending laterally away from the body beyond a diameter of the body, and first portion coupled to the second portion and extending perpendicularly away from the body; and a cover plate movably disposable beneath and with respect to the body between a first position disposed completely beneath the body, and a second position wherein the cover plate is disposed over the first portion of the utilities feed and includes a first portion disposed beneath the body, and wherein the first portion has a curved edge having a radius equal to the distance from a central axis of the support surface to the curved edge.

Abstract: A method for determining at least one maternal physiological parameter out of a heart rate and a breathing rate, comprising the following steps: (a) attaching at least two transducers units (16, 18) of a fetal monitoring system (10) to a maternal abdomen (14); (b) evaluating an acceleration signal regarding at least one out of frequency, amplitude, and signal pattern to derive an acceleration signal corresponding to the at least one maternal physiological parameter; a fetal monitoring system (10), comprising at least two transducers units (16, 18), at least one transducer (24, 26, 28) provided for taking up physiological parameters, at least a first signal processing unit (34), and at least one acceleration sensor (30, 32) different from the at least two transducers (24, 26, 28), wherein the at least one acceleration sensor (30, 32), in at least one operating mode, is rigidly mounted inside a housing (20, 22) of one of the at least two transducer units (16, 18); and wherein the first signal processing unit (3

Abstract: Substrate supports for use in process chambers having limited physical space for configuring chamber components are disclosed. In some embodiments, a substrate support may include a body having a support surface; a utilities feed coupled to the body and comprising a second portion coupled to and extending laterally away from the body beyond a diameter of the body, and first portion coupled to the second portion and extending perpendicularly away from the body; and a cover plate movably disposable beneath and with respect to the body between a first position disposed completely beneath the body, and a second position wherein the cover plate is disposed over the first portion of the utilities feed and includes a first portion disposed beneath the body, and wherein the first portion has a curved edge having a radius equal to the distance from a central axis of the support surface to the curved edge.