Patents by Inventor Benjamin Tsai
Benjamin Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240133755Abstract: MEMS force sensors for providing temperature coefficient of offset (TCO) compensation are described herein. An example MEMS force sensor can include a TCO compensation layer to minimize the TCO of the force sensor. The bottom side of the force sensor can be electrically and mechanically mounted on a package substrate while the TCO compensation layer is disposed on the top side of the sensor. It is shown the TCO can be reduced to zero with the appropriate combination of Young's modulus, thickness, and/or thermal coefficient of expansion (TCE) of the TCO compensation layer.Type: ApplicationFiled: December 11, 2023Publication date: April 25, 2024Inventors: Julius Minglin Tsai, Dan Benjamin
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Patent number: 11965787Abstract: An example microelectromechanical system (MEMS) force sensor is described herein. The MEMS force sensor can include a sensor die configured to receive an applied force. The sensor die can include a first substrate and a second substrate, where a cavity is formed in the first substrate, and where at least a portion of the second substrate defines a deformable membrane. The MEMS force sensor can also include an etch stop layer arranged between the first substrate and the second substrate, and a sensing element arranged on a surface of the second substrate. The sensing element can be configured to convert a strain on the surface of the membrane substrate to an analog electrical signal that is proportional to the strain.Type: GrantFiled: July 8, 2022Date of Patent: April 23, 2024Assignee: NextInput, Inc.Inventors: Julius Minglin Tsai, Ryan Diestelhorst, Dan Benjamin
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Patent number: 11946817Abstract: In one embodiment, a ruggedized wafer level microelectromechanical (“MEMS”) force sensor includes a base and a cap. The MEMS force sensor includes a flexible membrane and a sensing element. The sensing element is electrically connected to integrated complementary metal-oxide-semiconductor (“CMOS”) circuitry provided on the same substrate as the sensing element. The CMOS circuitry can be configured to amplify, digitize, calibrate, store, and/or communicate force values through electrical terminals to external circuitry.Type: GrantFiled: February 21, 2022Date of Patent: April 2, 2024Assignee: DecaWave, Ltd.Inventors: Ali Foughi, Ryan Diestelhorst, Dan Benjamin, Julius Minglin Tsai, Michael Dueweke
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Publication number: 20240105046Abstract: Systems and methods are disclosed to enable performance of a lens distance test in head-mounted displays (HMDs) to determine the distance between a user's eye and a lens of the HMD (e.g. the display lens in a virtual or augmented reality device). In embodiments, the HMD is configured to determine a current pose of the eye based on a series of captured eye images. The pose information is used to determine the distance from the apex of the cornea to a closest point on the lens. If the determined distance is too small or too large, an alert or notification is generated instructing to adjust the HMD or change the light seal to achieve better distancing, in order to reduce the risk of eye injury and/or improve user experience. In embodiments, the lens distance test may be repeated during a user session to reevaluate and/or monitor the lens distance.Type: ApplicationFiled: September 20, 2023Publication date: March 28, 2024Applicant: Apple Inc.Inventors: Chia-Yin Tsai, Kai Benjamin Quack, Hua Gao, Tom Sengelaub, Alper Yildirim
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Patent number: 11366069Abstract: Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating two or more corresponding images. The apparatus further comprises a processor for analyzing the two or more images to detect defects on the sample.Type: GrantFiled: July 2, 2020Date of Patent: June 21, 2022Assignee: KLA-TENCOR CORPORATIONInventors: Guoheng Zhao, Sheng Liu, Ben-Ming Benjamin Tsai
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Publication number: 20200333262Abstract: Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating two or more corresponding images.Type: ApplicationFiled: July 2, 2020Publication date: October 22, 2020Applicant: KLA-Tencor CorporationInventors: Guoheng Zhao, Sheng Liu, Ben-Ming Benjamin Tsai
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Patent number: 10788759Abstract: Prediction based systems and methods for optimizing wafer chucking and lithography control are disclosed. Distortions predicted to occur when a wafer is chucked by a chucking device are calculated and are utilized to control chucking parameters of the chucking device. Chucking parameters may include chucking pressures and chucking sequences. In addition, predicted distortions may also be utilized to facilitate application of anticipatory corrections. Controlling chucking parameters and/or applying anticipatory corrections help reducing or minimizing overlay errors.Type: GrantFiled: July 30, 2018Date of Patent: September 29, 2020Assignee: KLA-Tencor CorporationInventors: Bin-Ming Benjamin Tsai, Oreste Donzella, Pradeep Vukkadala, Jaydeep Sinha
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Patent number: 10739275Abstract: Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating two or more corresponding images. The apparatus further comprises a processor for analyzing the two or more images to detect defects on the sample.Type: GrantFiled: September 6, 2017Date of Patent: August 11, 2020Assignee: KLA-Tencor CorporationInventors: Guoheng Zhao, Sheng Liu, Ben-ming Benjamin Tsai
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Patent number: 10325004Abstract: Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.Type: GrantFiled: March 2, 2016Date of Patent: June 18, 2019Assignee: KLA-TENCOR CORPORATIONInventors: Thaddeus G. Dziura, Yung-Ho Chuang, Bin-Ming Benjamin Tsai, Xuefeng Liu, John J. Hench
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Patent number: 10216826Abstract: A system and method for mapping a standard set of database query statements to a set of query statements for a target database, including a processor to receive an identification of a target database and identify any extension set of query statements of the target database, receive a plurality of standard database query statements, and map each standard database query statement to a query statement for the target database on the basis of an extension set associated with the target database. A statement mapping database may be created to map the query statements of the target database to the standard database query statements such that the processor may receive a standard database query statement and identify a corresponding query statement that is appropriate for the target database, and receive a query statement of the target database and identify a corresponding standard database query statement.Type: GrantFiled: September 1, 2015Date of Patent: February 26, 2019Assignee: Salesforce.com, Inc.Inventor: Benjamin Tsai
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Publication number: 20180364579Abstract: Prediction based systems and methods for optimizing wafer chucking and lithography control are disclosed. Distortions predicted to occur when a wafer is chucked by a chucking device are calculated and are utilized to control chucking parameters of the chucking device. Chucking parameters may include chucking pressures and chucking sequences. In addition, predicted distortions may also be utilized to facilitate application of anticipatory corrections. Controlling chucking parameters and/or applying anticipatory corrections help reducing or minimizing overlay errors.Type: ApplicationFiled: July 30, 2018Publication date: December 20, 2018Inventors: Bin-Ming Benjamin Tsai, Oreste Donzella, Pradeep Vukkadala, Jaydeep Sinha
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Patent number: 10036964Abstract: Prediction based systems and methods for optimizing wafer chucking and lithography control are disclosed. Distortions predicted to occur when a wafer is chucked by a chucking device are calculated and are utilized to control chucking parameters of the chucking device. Chucking parameters may include chucking pressures and chucking sequences. In addition, predicted distortions may also be utilized to facilitate application of anticipatory corrections. Controlling chucking parameters and/or applying anticipatory corrections help reducing or minimizing overlay errors.Type: GrantFiled: March 12, 2015Date of Patent: July 31, 2018Assignee: KLA-Tencor CorporationInventors: Bin-Ming Benjamin Tsai, Oreste Donzella, Pradeep Vukkadala, Jaydeep Sinha
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Publication number: 20180073993Abstract: Disclosed is apparatus for inspecting a sample. The apparatus includes illumination optics for simultaneously directing a plurality of incident beams at a plurality of azimuth angles towards a sample and collection optics for directing a plurality of field portions of output light from two or more of the plurality of angles towards two or more corresponding sensors. The two or more sensors are arranged for receiving the field portions corresponding to two or more angles and generating two or more corresponding images.Type: ApplicationFiled: September 6, 2017Publication date: March 15, 2018Applicant: KLA-Tencor CorporationInventors: Guoheng Zhao, Sheng Liu, Ben-ming Benjamin Tsai
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Patent number: 9824102Abstract: In accordance with embodiments, there are provided mechanisms and methods for providing a team object in association with an object. These mechanisms and methods for providing a team object in association with an object can allow for centralized management of a team in association with an object. For example, members of the team may be automatically identified (e.g. without manual intervention) for receiving notifications in association with an object.Type: GrantFiled: October 23, 2015Date of Patent: November 21, 2017Assignee: salesforce.com, inc.Inventors: Benjamin Tsai, Michael Tang, Marco Casalaina
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Patent number: 9645097Abstract: Disclosed are methods and apparatus for inspecting and processing semiconductor wafers. The system includes an edge detection system for receiving each wafer that is to undergo a photolithography process. The edge detection system comprises an illumination channel for directing one or more illumination beams towards a side, top, and bottom edge portion that are within a border region of the wafer. The edge detection system also includes a collection module for collecting and sensing output radiation that is scattered or reflected from the edge portion of the wafer and an analyzer module for locating defects in the edge portion and determining whether each wafer is within specification based on the sensed output radiation for such wafer. The photolithography system is configured for receiving from the edge detection system each wafer that has been found to be within specification. The edge detection system is coupled in-line with the photolithography system.Type: GrantFiled: June 17, 2015Date of Patent: May 9, 2017Assignee: KLA-Tencor CorporationInventors: Lena Nicolaides, Ben-ming Benjamin Tsai, Prashant A. Aji, Michael Gasvoda, Stanley E. Stokowski, Guoheng Zhao, Youxian Wen, Mohan Mahadevan, Paul D. Horn, Wolfgang Vollrath, Isabella T. Lewis
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Publication number: 20160239600Abstract: Prediction based systems and methods for optimizing wafer chucking and lithography control are disclosed. Distortions predicted to occur when a wafer is chucked by a chucking device are calculated and are utilized to control chucking parameters of the chucking device. Chucking parameters may include chucking pressures and chucking sequences. In addition, predicted distortions may also be utilized to facilitate application of anticipatory corrections. Controlling chucking parameters and/or applying anticipatory corrections help reducing or minimizing overlay errors.Type: ApplicationFiled: March 12, 2015Publication date: August 18, 2016Inventors: Bin-Ming Benjamin Tsai, Oreste Donzella, Pradeep Vukkadala, Jaydeep Sinha
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Patent number: 9377414Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.Type: GrantFiled: April 1, 2014Date of Patent: June 28, 2016Assignee: KLA-Tencor CorporationInventors: Yung-Ho Chuang, Richard W. Solarz, David R. Shafer, Bin-Ming Benjamin Tsai, David L. Brown
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Patent number: 9310296Abstract: Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.Type: GrantFiled: June 20, 2011Date of Patent: April 12, 2016Assignee: KLA-TENCOR CORPORATIONInventors: Thaddeus G. Dziura, Yung-Ho Chuang, Bin-ming Benjamin Tsai, Xuefeng Liu, John J. Hench
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Publication number: 20160063063Abstract: A system and method for mapping a standard set of database query statements to a set of query statements for a target database, including a processor to receive an identification of a target database and identify any extension set of query statements of the target database, receive a plurality of standard database query statements, and map each standard database query statement to a query statement for the target database on the basis of an extension set associated with the target database. A statement mapping database may be created to map the query statements of the target database to the standard database query statements such that the processor may receive a standard database query statement and identify a corresponding query statement that is appropriate for the target database, and receive a query statement of the target database and identify a corresponding standard database query statement.Type: ApplicationFiled: September 1, 2015Publication date: March 3, 2016Inventor: Benjamin Tsai
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Publication number: 20160042018Abstract: In accordance with embodiments, there are provided mechanisms and methods for providing a team object in association with an object. These mechanisms and methods for providing a team object in association with an object can allow for centralized management of a team in association with an object. For example, members of the team may be automatically identified (e.g. without manual intervention) for receiving notifications in association with an object.Type: ApplicationFiled: October 23, 2015Publication date: February 11, 2016Inventors: Benjamin Tsai, Michael Tang, Marco Casalaina