Patents by Inventor Benjamin W. Maynor

Benjamin W. Maynor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
    Publication number: 20090061152
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
    Type: Application
    Filed: July 6, 2007
    Publication date: March 5, 2009
    Inventors: Joseph M. DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansleye Dennis, Edward T. Samulski, R. Jude Samulski
  • Methods for Fabrication Isolated Micro-and Nano-Structures Using Soft or Imprint Lithography
    Publication number: 20090028910
    Abstract: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
    Type: Application
    Filed: December 20, 2004
    Publication date: January 29, 2009
    Inventors: Joseph M DeSimone, Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ginger Denison Rothrock, Ansley E. Dennis, Edward T. Samulski, R.Jude Samulski
  • Nanoparticle fabrication methods, systems, and materials
    Publication number: 20080181958
    Abstract: Nanosized particles are molded from granules of organic substances in nano-scale molds. The nano-scale molds can be fabricated from non-wetting, low surface energy polymeric materials. The nanosized particles can be virtually any shape, are typically less than 500 micrometers in a broadest dimension, and can include pharmaceutical compositions, biologic drugs, drug compositions, organic materials, and the like.
    Type: Application
    Filed: July 17, 2007
    Publication date: July 31, 2008
    Inventors: Ginger D. Rothrock, Benjamin W. Maynor