Patents by Inventor Benjamine NAVET

Benjamine NAVET has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210249223
    Abstract: Substrates that can act as optical elements for transmitting infrared light and that have low reflectance for infrared light and the assembly of such substrates with a source of infrared light and/or with an infrared-sensitive optical component. The substrates are suitable for cover glasses and optical elements, such as lenses, prisms, or mirrors to be used with infrared light. Ions are implanted into a substrate in order to reduce its reflectance of infrared light.
    Type: Application
    Filed: June 13, 2019
    Publication date: August 12, 2021
    Applicants: AGC GLASS EUROPE, AGC INC., AGC FLAT GLASS NORTH AMERICA, INC., AGO VIDROS DO BRASIL LTDA
    Inventors: Benjamine NAVET, Amory JACQUES, Philippe ROQUINY
  • Patent number: 11066329
    Abstract: A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and ?2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: July 20, 2021
    Assignees: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine Navet, Pierre Boulanger, Denis Busardo
  • Publication number: 20210087106
    Abstract: A glass sheet comprising at least one antireflective, etched surface having a surface roughness defined, when measured on an evaluation length of 12 mm and with a Gaussian filter with a cut-off wavelength is 0.8 mm, by: 0.02?Ra?0.6 ?m; 0.1?Rz?3 ?m; and 5?RSm?180 ?m. The glass sheet has the following optical properties, when measured from the antireflective, etched surface: a haze value of from 1 to 40%; a clarity value of from 30 to 100%; a gloss value at 60° of from 20 to 130 SGU; and a luminous reflectance Rc from 4 to 7%. The antireflective, etched surface comprises implanted ions. Such a glass sheet is particularly suitable for display applications as cover glass and has excellent sparkle reduction properties together with an anti-glare effect.
    Type: Application
    Filed: February 21, 2019
    Publication date: March 25, 2021
    Applicants: AGC GLASS EUROPE, AGC INC., AGC FLAT GLASS NORTH AMERICA INC., AGC VIDROS DO BRASIL LTDA
    Inventors: Benjamine NAVET, Amory JACQUES
  • Publication number: 20200325067
    Abstract: A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×1016 ions/cm2 and ?5.00×1015×A/kV+2.00×1017 ions/cm2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.
    Type: Application
    Filed: March 13, 2017
    Publication date: October 15, 2020
    Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
  • Patent number: 10703674
    Abstract: The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: July 7, 2020
    Assignees: AGC GLASS EUROPE, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine Navet, Pierre Boulanger, Lionel Ventelon, Denis Busardo, Frederic Guernalec
  • Publication number: 20190161403
    Abstract: A method for manufacturing blue reflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 15 kV and 35 kV and a dosage D between ?9.33×1015×A/kV+3.87×1017 ions/cm2 and 7.50×1017 ions/cm2. A blue reflective glass substrate including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.
    Type: Application
    Filed: March 13, 2017
    Publication date: May 30, 2019
    Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
  • Publication number: 20190161404
    Abstract: A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and ?2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
    Type: Application
    Filed: March 13, 2017
    Publication date: May 30, 2019
    Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
  • Publication number: 20190119155
    Abstract: The invention concerns a method for manufacturing heat treatable antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, O2, or Ar, ionizing the source gas so as to form a mixture of single charge and multicharge ions of Ar, N, or O, forming a beam of single charge and multicharge ions of Ar, N, or O by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and setting the ion dosage at a value comprised between 7.5×1016 and 7.5×1017 ions/cm2. The invention further concerns heat treatable and heat treated antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
    Type: Application
    Filed: March 13, 2017
    Publication date: April 25, 2019
    Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine NAVET, Pierre BOULANGER
  • Publication number: 20190119154
    Abstract: The invention concerns a method for manufacturing glass substrates with reduced internal reflectance by ion implantation, comprising ionizing a source gas of N2, O2, Ar, and/or He so as to form a mixture of single charge and multicharge ions of N, O, Ar, and/or He forming a beam of single charge and multicharge ions of N, O, Ar, and/or He, by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and an ion dosage comprised between 1017 ions/cm2 and 1018 ions/cm2. The invention further concerns glass substrates having reduced internal reflectance, comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
    Type: Application
    Filed: March 13, 2017
    Publication date: April 25, 2019
    Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, ASAHI GLASS CO LTD, QUERTECH INGÉNIERIE
    Inventors: Benjamine NAVET, Pierre BOULANGER
  • Publication number: 20190092683
    Abstract: The invention concerns a method for manufacturing scratch-resistant antireflective glass substrates by ion implantation, comprising ionizing a source gas of N2 so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N, by accelerating with an acceleration voltage comprised between 20 kV and 30 kV and an ion dosage comprised between 5×1016 ions/cm2 and 1017 ions/cm2. The invention further concerns scratch-resistant antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
    Type: Application
    Filed: March 13, 2017
    Publication date: March 28, 2019
    Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
  • Publication number: 20180370852
    Abstract: The invention relates to a glass substrate for chemical strengthening where a side is treated by ion implantation so as to reduce the extent of ion exchange upon chemical strengthening. Other embodiments relate to a method for making a chemically strengthened glass substrate with controlled curvature comprising: providing a substrate having first and second opposing sides, wherein the substrate presents in the surface layer of at least part of the first side a first ion implantation profile that reduces the extent of ion exchange upon chemical strengthening and chemically strengthening the ion implantation treated glass substrate. The parameters of the ion implantation are chosen such that a controlled curvature is obtained upon chemical strengthening.
    Type: Application
    Filed: December 1, 2016
    Publication date: December 27, 2018
    Applicants: AGC GLASS EUROPE, ASAHI GLASS CO LTD
    Inventors: Benjamine NAVET, Pierre BOULANGER
  • Publication number: 20170334775
    Abstract: The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.
    Type: Application
    Filed: October 21, 2015
    Publication date: November 23, 2017
    Applicants: AGC GLASS EUROPE, ASAHI GLASS CO LTD, QUERTECH INGENIERIE
    Inventors: Benjamine NAVET, Pierre BOULANGER, Lionel VENTELON, Denis BUSARDO, Frederic GUERNALEC