Patents by Inventor Benjamine NAVET
Benjamine NAVET has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11339089Abstract: A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×1016 ions/cm2 and ?5.00×1015×A/kV+2.00×1017 ions/cm2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.Type: GrantFiled: March 13, 2017Date of Patent: May 24, 2022Assignees: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine Navet, Pierre Boulanger, Denis Busardo
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Publication number: 20220145447Abstract: A fractioning device for an ion implantation device with at least one fractioning wall, wherein the fractioning device is suitable for being inserted within a channel. The channel is configured to connect an ion source, which is at a first pressure p1 and a processing chamber, which is at a second pressure p2 in an ion implantation device.Type: ApplicationFiled: February 25, 2020Publication date: May 12, 2022Applicants: AGC GLASS EUROPE, AGC INC., AGC FLAT GLASS NORTH AMERICA, INC., AGC VIDROS DO BRASIL LTDAInventors: Philippe ROQUINY, José FERNANDES, Nicolas RIVOLTA, Benjamine NAVET, Amory JACQUES
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Publication number: 20210347688Abstract: A method of implanting ions to modify the invading ion surface layer concentration of a chemically strengthened glass substrate, where the ions are selected from the group consisting of N, H, O, He, Ne, Ar, and Kr and are implanted in the chemically strengthened glass substrate with a dosage between 1014 ions/cm2 and 1018 ions/cm2, and an acceleration voltage between 5 kV and 100 kV.Type: ApplicationFiled: July 24, 2019Publication date: November 11, 2021Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC VIDROS DO BRASIL LTDA, AGC INC.Inventors: Benjamine NAVET, Jacques AMORY
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Publication number: 20210249223Abstract: Substrates that can act as optical elements for transmitting infrared light and that have low reflectance for infrared light and the assembly of such substrates with a source of infrared light and/or with an infrared-sensitive optical component. The substrates are suitable for cover glasses and optical elements, such as lenses, prisms, or mirrors to be used with infrared light. Ions are implanted into a substrate in order to reduce its reflectance of infrared light.Type: ApplicationFiled: June 13, 2019Publication date: August 12, 2021Applicants: AGC GLASS EUROPE, AGC INC., AGC FLAT GLASS NORTH AMERICA, INC., AGO VIDROS DO BRASIL LTDAInventors: Benjamine NAVET, Amory JACQUES, Philippe ROQUINY
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Patent number: 11066329Abstract: A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and ?2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.Type: GrantFiled: March 13, 2017Date of Patent: July 20, 2021Assignees: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine Navet, Pierre Boulanger, Denis Busardo
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Publication number: 20210087106Abstract: A glass sheet comprising at least one antireflective, etched surface having a surface roughness defined, when measured on an evaluation length of 12 mm and with a Gaussian filter with a cut-off wavelength is 0.8 mm, by: 0.02?Ra?0.6 ?m; 0.1?Rz?3 ?m; and 5?RSm?180 ?m. The glass sheet has the following optical properties, when measured from the antireflective, etched surface: a haze value of from 1 to 40%; a clarity value of from 30 to 100%; a gloss value at 60° of from 20 to 130 SGU; and a luminous reflectance Rc from 4 to 7%. The antireflective, etched surface comprises implanted ions. Such a glass sheet is particularly suitable for display applications as cover glass and has excellent sparkle reduction properties together with an anti-glare effect.Type: ApplicationFiled: February 21, 2019Publication date: March 25, 2021Applicants: AGC GLASS EUROPE, AGC INC., AGC FLAT GLASS NORTH AMERICA INC., AGC VIDROS DO BRASIL LTDAInventors: Benjamine NAVET, Amory JACQUES
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Publication number: 20200325067Abstract: A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×1016 ions/cm2 and ?5.00×1015×A/kV+2.00×1017 ions/cm2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.Type: ApplicationFiled: March 13, 2017Publication date: October 15, 2020Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
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Patent number: 10703674Abstract: The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.Type: GrantFiled: October 21, 2015Date of Patent: July 7, 2020Assignees: AGC GLASS EUROPE, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine Navet, Pierre Boulanger, Lionel Ventelon, Denis Busardo, Frederic Guernalec
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Publication number: 20190161404Abstract: A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and ?2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.Type: ApplicationFiled: March 13, 2017Publication date: May 30, 2019Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
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Publication number: 20190161403Abstract: A method for manufacturing blue reflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 15 kV and 35 kV and a dosage D between ?9.33×1015×A/kV+3.87×1017 ions/cm2 and 7.50×1017 ions/cm2. A blue reflective glass substrate including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.Type: ApplicationFiled: March 13, 2017Publication date: May 30, 2019Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
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Publication number: 20190119154Abstract: The invention concerns a method for manufacturing glass substrates with reduced internal reflectance by ion implantation, comprising ionizing a source gas of N2, O2, Ar, and/or He so as to form a mixture of single charge and multicharge ions of N, O, Ar, and/or He forming a beam of single charge and multicharge ions of N, O, Ar, and/or He, by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and an ion dosage comprised between 1017 ions/cm2 and 1018 ions/cm2. The invention further concerns glass substrates having reduced internal reflectance, comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.Type: ApplicationFiled: March 13, 2017Publication date: April 25, 2019Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, ASAHI GLASS CO LTD, QUERTECH INGÉNIERIEInventors: Benjamine NAVET, Pierre BOULANGER
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Publication number: 20190119155Abstract: The invention concerns a method for manufacturing heat treatable antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, O2, or Ar, ionizing the source gas so as to form a mixture of single charge and multicharge ions of Ar, N, or O, forming a beam of single charge and multicharge ions of Ar, N, or O by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and setting the ion dosage at a value comprised between 7.5×1016 and 7.5×1017 ions/cm2. The invention further concerns heat treatable and heat treated antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.Type: ApplicationFiled: March 13, 2017Publication date: April 25, 2019Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine NAVET, Pierre BOULANGER
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Publication number: 20190092683Abstract: The invention concerns a method for manufacturing scratch-resistant antireflective glass substrates by ion implantation, comprising ionizing a source gas of N2 so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N, by accelerating with an acceleration voltage comprised between 20 kV and 30 kV and an ion dosage comprised between 5×1016 ions/cm2 and 1017 ions/cm2. The invention further concerns scratch-resistant antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.Type: ApplicationFiled: March 13, 2017Publication date: March 28, 2019Applicants: AGC GLASS EUROPE, AGC GLASS COMPANY NORTH AMERICA, AGC Inc., QUERTECH INGENIERIEInventors: Benjamine NAVET, Pierre BOULANGER, Denis BUSARDO
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Publication number: 20180370852Abstract: The invention relates to a glass substrate for chemical strengthening where a side is treated by ion implantation so as to reduce the extent of ion exchange upon chemical strengthening. Other embodiments relate to a method for making a chemically strengthened glass substrate with controlled curvature comprising: providing a substrate having first and second opposing sides, wherein the substrate presents in the surface layer of at least part of the first side a first ion implantation profile that reduces the extent of ion exchange upon chemical strengthening and chemically strengthening the ion implantation treated glass substrate. The parameters of the ion implantation are chosen such that a controlled curvature is obtained upon chemical strengthening.Type: ApplicationFiled: December 1, 2016Publication date: December 27, 2018Applicants: AGC GLASS EUROPE, ASAHI GLASS CO LTDInventors: Benjamine NAVET, Pierre BOULANGER
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Publication number: 20170334775Abstract: The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.Type: ApplicationFiled: October 21, 2015Publication date: November 23, 2017Applicants: AGC GLASS EUROPE, ASAHI GLASS CO LTD, QUERTECH INGENIERIEInventors: Benjamine NAVET, Pierre BOULANGER, Lionel VENTELON, Denis BUSARDO, Frederic GUERNALEC