Patents by Inventor Bennett Olson

Bennett Olson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phase-shift photomask and patterning method
    Publication number: 20110159411
    Abstract: A phase shift photomask blank has a quartz substrate, a lower chrome layer, a light-absorbing MoSi layer, and an upper chrome layer. This mask can be patterned in various ways to form a patterned photomask with both phase shift and binary areas.
    Type: Application
    Filed: December 30, 2009
    Publication date: June 30, 2011
    Inventors: Bennett Olson, Max Lau, Cheng-hsin Ma, Jian Ma, Andrew T. Jamieson