Abstract: Pattern transfer sheets, methods of monitoring pattern transfer printing, and pattern transfer printing systems are provided, for monitoring and adjusting laser illumination used for transferring paste patterns from trenches on the sheets onto a substrate such as electronic circuitry and/or solar cell substrates. Pattern transfer sheets comprise, outside the pattern, (i) trace mark(s) configured to receive the printing paste, aligned to the trenches and are wider than the width of the illuminating laser beam—to detect misalignment of paste release from within the trace mark(s) and/or (ii) working window marks configured to receive the printing paste, set at specified offsets with respect to specific trenches, with different working window marks set at different offsets—to correct the effective working window by adjusting the power of the laser beam.

Abstract: A method for laser drilling of holes in a substrate (44) with varying simultaneity including operating a laser (22) to produce a single output beam (24) whose pulses have a total energy, dividing the single output beam into plural beams (41) to an extent which varies over time and applying the plural beams to plural hole drilling locations (209, 210, 212, 214, 216, 218, 220, 222) on the substrate including simultaneously drilling first parts of multiple holes using corresponding ones of the plural beams having a pulse energy which is a first fraction of the total energy and thereafter drilling at least one second part of at least one of the multiple holes using at least one of the plural beams each having a pulse energy which is at least a second fraction of the total energy, the second fraction being different from the first fraction.

Abstract: A method for laser drilling of holes in a substrate (44) with varying simultaneity including operating a laser (22) to produce a single output beam (24) whose pulses have a total energy, dividing the single output beam into plural beams (41) to an extent which varies over time and applying the plural beams to plural hole drilling locations (209, 210, 212, 214, 216, 218, 220, 222) on the substrate including simultaneously drilling first parts of multiple holes using corresponding ones of the plural beams having a pulse energy which is a first fraction of the total energy and thereafter drilling at least one second part of at least one of the multiple holes using at least one of the plural beams each having a pulse energy which is at least a second fraction of the total energy, the second fraction being different from the first fraction.