Abstract: The present disclosure relates to the field of electrical connection of cables and the like, for all industries and in particular in the aeronautic or automotive industry. A single pass-through connector for connecting first cables and second cables disposed in respective first area and second area of a vehicle, the single pass-through connector having a frame body and a plurality of first communication network connectors for receiving portions of the first cables and of the second cables, each first communication network connector has a back portion and a front portion, and wherein each first communication network connector is arranged for receiving the corresponding first cable from the back portion, and for receiving the corresponding second cable from the front portion, so as to connect the corresponding first cable and the corresponding second cable together and pass-through a separation between the two areas.

Abstract: A micromechanical sensor system that includes a mass that is deflectable at least in the z direction. A stop element having an elastic design is situated on the mass on at least one of the sides oriented in the z direction, via a connection element.

Abstract: A microelectromechanical component including, vertically at a distance from one another, a substrate device, a first, a second, and a third functional layer, a vertical stop being formed between the second and third functional layer, the vertical stop having a stop area on a surface of the second functional layer facing the third functional layer, wherein the second functional layer is connected to the first functional layer in a connecting area allocated to the stop area.

Abstract: A micromechanical sensor includes a first functional layer, a second functional layer, and a third functional layer The second functional layer is situated between the first and third functional layers. The second and third functional layers are connected to each other by a connecting area of the third functional layer. The second functional layer is underneath the connecting area at a defined distance from the first functional layer. The first functional layer is underneath the connecting area on an oxide that is situated on a substrate.

Abstract: A micromechanical sensor that is produced surface-micromechanically includes at least one mass element formed in a third functional layer that is non-perforated at least in certain portions. The sensor has a gap underneath the mass element that is formed by removal of a second functional layer and at least one oxide layer. The removal of the at least one oxide layer takes place by introducing a gaseous etching medium into a defined number of etching channels arranged substantially parallel to one another. The etching channels are configured to be connected to a vertical access channel in the third functional layer.

Abstract: A micromechanical sensor system that includes a mass that is deflectable at least in the z direction. A stop element having an elastic design is situated on the mass on at least one of the sides oriented in the z direction, via a connection element.

Abstract: A micromechanical sensor includes a first functional layer, a second functional layer, and a third functional layer The second functional layer is situated between the first and third functional layers. The second and third functional layers are connected to each other by a connecting area of the third functional layer. The second functional layer is underneath the connecting area at a defined distance from the first functional layer. The first functional layer is underneath the connecting area on an oxide that is situated on a substrate.

Abstract: A microelectromechanical component including, vertically at a distance from one another, a substrate device, a first, a second, and a third functional layer, a vertical stop being formed between the second and third functional layer, the vertical stop having a stop area on a surface of the second functional layer facing the third functional layer, wherein the second functional layer is connected to the first functional layer in a connecting area allocated to the stop area.

Abstract: A micromechanical sensor that is produced surface-micromechanically includes at least one mass element formed in a third functional layer that is non-perforated at least in certain portions. The sensor has a gap underneath the mass element that is formed by removal of a second functional layer and at least one oxide layer. The removal of the at least one oxide layer takes place by introducing a gaseous etching medium into a defined number of etching channels arranged substantially parallel to one another. The etching channels are configured to be connected to a vertical access channel in the third functional layer.

Abstract: A micromechanical acceleration sensor, having at least two identically fashioned micromechanical sensor cores, wherein the two sensor cores on the acceleration sensor are configured so as to be rotated by 180° relative to one another, or one of the two sensor cores is configured in mirrored fashion in relation to an axis running centrically through the other of the two sensor cores and oriented orthogonally to a transverse force capable of acting on the acceleration sensor.

Abstract: A seismic detection element for a micromechanical sensor, having a first functional layer, a second functional layer and a third functional layer, the second functional layer being situated between the first functional layer and the third functional layer; a defined number of cavities being developed in the second functional layer; reinforcement elements being situated between the cavities, which are firmly connected to the first functional layer and to the third functional layer.