Abstract: The present invention relates to the use of at least one caprolactam derivative of formula (I) below: in which: n=0 or 1; m=0 or 1; p=0 to 13; R1 is a linear or branched alkyl radical comprising a number t of carbon atoms of from 1 to 20; subject to the following conditions: (i) when p=0, m=0, (ii) when p=1 and n=1, m=1, (iii) when p=1 and n=0, m=0 and R1 denotes a C2-C20 alkyl radical; with the proviso that the sum of p+t is between 3 and 20, in a composition comprising, in a cosmetically acceptable medium, at least one liquid fatty phase and at least one lipophilic active agent, and containing no dibenzoylmethane-type UV screening agent, as a solvent for said active agent in said liquid fatty phase and/or as an agent improving the solubility of said active agent in the solid fatty phase.

Abstract: The present invention relates to the cosmetic use of a compound of formula (I) and also the cosmetically acceptable salts thereof, solvates thereof and isomers thereof, for non-therapeutic skincare.

Abstract: Compounds of general formula (I): in which n, G, Q1, Q2, X1, X2, Y and Z are as defined in the description, process for preparing these compounds, fungicidal compositions comprising these compounds, processes for treating plants by applying these compounds or compositions.

Abstract: The present invention relates to the cosmetic use of a compound of formula (I) and also the cosmetically acceptable salts thereof, solvates thereof and isomers thereof, for non-therapeutic skincare.

Abstract: The present invention relates to cosmetic compositions comprising a compound of formula (I) cosmetically acceptable salts thereof, solvates thereof and isomers thereof, that may be used in non-therapeutic skincare.

Abstract: UV-screening compositions, formulated into a cosmetically acceptable medium, contain at least one ester solvent derived from 4-carboxy-2-pyrrolidinone, of formula (I) below: in which: R1 is a linear or branched C1-C20 alkyl radical, R2 is a linear or branched C1-C20 alkyl radical that may contain a C5-C6 ring member, the phenyl radical, the benzyl radical or the phenethyl radical, and at least one triazine-type lipophilic UV-screening agent.

Abstract: Stable UV-screening cosmetic compositions contain at least one ester solvent derived from 4-carboxy-2-pyrrolidinone, of formula (I): in which: R1 is a linear or branched C1-C20 alkyl radical, and R2 is a linear or branched C1-C20 alkyl radical optionally containing a C5-C6 ring member, the phenyl radical, the benzyl radical or the phenethyl radical, and at least one liquid fatty phase and at least one lipophilic UV-screening active agent, the at least one ester derivative constituting a solvent for the at least one active agent in the at least one liquid fatty phase and/or constituting an agent for improving the solubility of the at least one active agent in the at least one fatty phase.

Abstract: Cosmetic/sunscreen compositions contain a combination of at least one dibenzoylmethane sunscreen compound and a photostabilizing amount of at least one dithiolane compound of formula (I) below:

Abstract: Compounds of general formula (I), in which Het represents a five or six membered saturated, partially unsaturated or aromatic ring containing between one and six heteroatoms of the group N, O, S, in which the heterocycle is substituted in an adjacent manner with —P-Q1-T-Q2, -GZ and Y, such that the substituant -GZ is adjacent to both, the other substituants being as defined in the description, process for preparing this compound, fungicidal composition comprising this compound, method for treating plants by applying this compound or composition.

Abstract: Photostable, topically applicable cosmetic/dermatological compositions contain at least one dibenzoylmethane sunscreen compound and at least one photostabilizing siloxane-containing arylalkyl amide compound of formula (I) below:

Abstract: Compound of general formula (I), in which: Y and G together with carbon atoms 3 and 4, form a 5 or 6 member ring chosen from the following structures (A) to (F), the other substituents being as defined in the description. Process for preparing this compound. Fungicidal composition comprising this compound. Method for treating plants by applying this compound or composition.

Abstract: Compounds of general formula (I), in which Het represents a five or six membered saturated, partially unsaturated or aromatic ring containing between one and six heteroatoms of the group N, O, S, in which the heterocycle is substituted in an adjacent manner with —P-Q1-T-Q2, -GZ and Y, such that the substituant -GZ is adjacent to both, the other substituants being as defined in the description, process for preparing this compound, fungicidal composition comprising this compound, method for treating plants by applying this compound or composition.

Abstract: Compounds of general formula (I), in which Het represents a five or six membered saturated, partially unsaturated or aromatic ring containing between one and six heteroatoms of the group N, O, S, in which the heterocycle is substituted in an adjacent manner with -P-Qi-T-Q2, -GZ and Y, such that the substituant -GZ is adjacent to both, the other substituants being as defined in the description, process for preparing this compound, fungicidal composition comprising this compound, method for treating plants by applying this compound or composition

Abstract: The present invention relates to the cosmetic use of a compound of formula (I) and also the cosmetically acceptable salts thereof, solvates thereof and isomers thereof, for non-therapeutic skincare.

Abstract: Compound of general formula (I) in which Y is chosen from the following groups Y1 to Y3 (I*), the other substituents being as defined in the description, process for preparing this compound, fungicidal composition comprising this compound, method for treating plants by applying this compound or composition.

Abstract: Compounds of general formula (I), in which Het represents a five or six membered saturated, partially unsaturated or aromatic ring containing between one and six heteroatoms of the group N, O, S, in which the heterocycle is substituted in an adjacent manner with -P-Qi-T-Q2, -GZ and Y, such that the substituant -GZ is adjacent to both, the other substituants being as defined in the description, process for preparing this compound, fungicidal composition comprising this compound, method for treating plants by applying this compound or composition.

Abstract: Compound of general formula (I), in which: Y and G together with carbon atoms 3 and 4, form a 5 or 6 member ring chosen from the following structures (A) to (F), the other substituents being as defined in the description. Process for preparing this compound. Fungicidal composition comprising this compound. Method for treating plants by applying this compound or composition.

Abstract: Compound of general formula (I) in which Y is chosen from the following groups Y1 to Y3 (I*), the other substituents being as defined in the description, process for preparing this compound, fungicidal composition comprising this compound, method for treating plants by applying this compound or composition.

Abstract: The invention concerns compounds of general formula (1) wherein: n, G, Q1, Q2, X1, X2, Y and Z are as defied in the description, the method for preparing said compounds, fungicide compositions comprising said compounds and methods for treating plants using said compounds or compositions.