Patents by Inventor BenQ Materials Corporation

BenQ Materials Corporation has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130183397
    Abstract: An engraving apparatus of rubbing rollers for manufacturing retarder films is provided. The engraving apparatus comprises a body and an engraving end including a plurality of micro-groove structures. The plurality of micro-groove structures of the engraving end are arranged in parallel or irregularly. The engraving apparatus rubs on the rollers using the engraving end in a predetermined direction. Then the predetermined pattern structures are rubbed on the roller. In the rubbing process, the engraving apparatus can rub different pattern structures backwards and forwards directly without to move the engraving apparatus to the starting position of engraving paths. It keeps the manufacturing speed to manufacture the retarder film for saving the process time and the manufactured retarder film with the accuracy.
    Type: Application
    Filed: January 18, 2013
    Publication date: July 18, 2013
    Applicant: BENQ MATERIALS CORPORATION
    Inventor: BENQ MATERIALS CORPORATION
  • Publication number: 20130178551
    Abstract: This invention discloses an antistatic coating composition and antistatic film coated with the same. The antistatic coating composition comprises a hard coating solution and an antistatic solution. The hard coating solution comprises from 20 to 35 parts by weight of an acrylic oligomer, from 5 to 10 parts by weight of an acrylic monomer, from 40 to 60 parts by weight of a solvent and from 1 to 5 parts by weight of a photoinitiator. The antistatic solution comprises from 0.5 to 5 parts by weight of polyacrylic acid and from 1 to 20 parts by weight of ionic liquid. The antistatic film formed by coating the antistatic coating composition has a pencil hardness of 2H and an initial surface resistivity in the range of 108˜1011?/?, and the surface resistivity will maintain in the range of 1010˜1012?/? after isopropanol (IPA) washing.
    Type: Application
    Filed: December 20, 2012
    Publication date: July 11, 2013
    Applicant: BENQ MATERIALS CORPORATION
    Inventor: BENQ MATERIALS CORPORATION
  • Publication number: 20130083415
    Abstract: A color filter and a method for manufacturing the same are provided. The method comprises the steps of providing a substrate having a color filter layer; forming an alignment material layer on the color filter layer; embossing the alignment material layer with an embossing means to transfer a microstructure from the surface structure of the embossing means onto the alignment material layer to form an alignment layer, wherein the alignment layer has a plurality of spacers and a plurality of alignment protrusions, and the height of each of the spacer is greater than the height of each of the alignment protrusion; and curing the alignment layer.
    Type: Application
    Filed: October 2, 2012
    Publication date: April 4, 2013
    Applicant: BENQ MATERIALS CORPORATION
    Inventor: BenQ Materials Corporation