Patents by Inventor Benu Patel

Benu Patel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060226553
    Abstract: A process for etching a sacrificial layer of a structure. The structure is exposed to a plasma derived from nitrogen trifluoride for etching the sacrificial layer. The process is selective in that it etches titanium-nitride and titanium but does not affect adjacent silicon dioxide or aluminum layers. Applications of the process include the formation of integrated circuit structures and MEMS structures.
    Type: Application
    Filed: March 6, 2006
    Publication date: October 12, 2006
    Inventors: Timothy Campbell, Daniel Chesire, Kelly Hinckley, Gregory Head, Benu Patel
  • Publication number: 20050068608
    Abstract: A process for etching a sacrificial layer of a structure. The structure is exposed to a plasma derived from nitrogen trifluoride for etching the sacrificial layer. The process is selective in that it etches titanium-nitride and titanium but does not affect adjacent silicon dioxide or aluminum layers. Applications of the process include the formation of integrated circuit structures and MEMS structures.
    Type: Application
    Filed: September 30, 2003
    Publication date: March 31, 2005
    Inventors: Timothy Campbell, Daniel Chesire, Kelly Hinckley, Gregory Head, Benu Patel