Patents by Inventor Benxin Xia

Benxin Xia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • VACUUM PLASMA PPROCESSING CHAMBER WITH A WAFER CHUCK FACING DOWNWARD ABOVE THE PLASMA
    Publication number: 20120298302
    Abstract: A process plasma chamber for processing a wafer may include a chamber body for processing the wafer, a wafer chuck for positioning the wafer within the chamber body and a plasma body being generated by RF power in the chamber body. The wafer chuck may position the wafer downwards and above the plasma body. The chamber body may include a showerhead positioned below the plasma body. The chamber body may include a first top electrode for receiving RF power. The chamber body may include a second top electrode for receiving RF power.
    Type: Application
    Filed: May 13, 2012
    Publication date: November 29, 2012
    Inventors: Yaomin Xia, Shang-Fen Ren, Benxin Xia