Abstract: A method of etching a metal oxide layer, by using atomic layer etching (ALE), may include providing a first precursor including a fluorinated material to a target surface of the metal oxide layer, forming a metal fluorinated layer by fluorinating the target surface of the metal oxide layer with the first precursor, providing a second precursor including a metal halogenated material to the metal fluorinated layer, and removing the metal fluorinated layer from the metal oxide layer by generating a volatile reactant from a reaction between the metal fluorinated layer and the metal halogenated material.

Abstract: Provided is an image processing method including upscaling an input image to generate an upscaled image, obtaining a first feature map and a second feature map by inputting the upscaled image to a convolutional neural network and performing a convolution operation on the upscaled image with one or more kernels included in the convolutional neural network, obtaining a gain map by inputting the first feature map to a first convolutional layer, obtaining an offset map by inputting the second feature map to a second convolutional layer, and generating an output image, based on the upscaled image, the gain map, and the offset map, wherein the convolutional neural network is configured to be trained to reduce a difference between a hue of the input image and a hue of the output image.

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 below, a resist composition including the same, a method of forming a pattern by using the same, and a monomer represented by Formula 10 below. In Formulae 1 and 10, L11 to L13, a11 to a13, X11, Rf, and R11 to R13 are as described in the specification.

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1, a resist composition including the polymer, and a method of forming a pattern using the resist composition: wherein descriptions of L11 to L14, a11 to a13, A11, X11, R11, R12, b12 and p in Formula 1 are provided in the present specification.

Abstract: A capacitor includes a first electrode, a second electrode spaced apart from the first electrode, a dielectric layer arranged between the first electrode and the second electrode, and an interface layer arranged between the second electrode and the dielectric layer, wherein the interface layer includes a first element, a second element, and a third element, the first element includes aluminum (Al), the second element includes gallium (Ga), and the third element includes oxygen (O).

Abstract: Provided is a method of forming an insulating film on a substrate by using atomic layer deposition (ALD). The method of forming an insulating film on a substrate by using ALD includes transferring a deposition-hindering material to the substrate, and depositing a first material layer by transferring a first precursor to the deposition-hindering material, wherein the deposition-hindering material includes an organic ligand, and the first precursor includes an alkoxide ligand.

Abstract: A battery safety system includes a flow valve and a sensing device. The flow valve is disposed on a housing of the battery and includes a first valve that is embedded inside the housing and a second valve that intersects the housing. The first valve includes a cavity through which analytes released upon electrochemical reactions within the battery flow towards the second valve. The second valve extends through the housing to the outside, and defines an opening through which the released analytes exit the housing. The sensing device is disposed within the cavity of the first valve of the valve and is situated in a manner to be in fluidic contact with the released analytes as they flow from the inside of the battery to the outside. In some aspects, the battery safety system can detect a minute presence of one or more analytes.

Abstract: A battery safety system includes a flow valve and a sensing device. The flow valve is disposed on a housing of the battery and includes a first valve that is embedded inside the housing and a second valve that intersects the housing. The first valve includes a cavity through which analytes released upon electrochemical reactions within the battery flow towards the second valve. The second valve extends through the housing to the outside, and defines an opening through which the released analytes exit the housing. The sensing device is disposed within the cavity of the first valve of the valve and is situated in a manner to be in fluidic contact with the released analytes as they flow from the inside of the battery to the outside. In some aspects, the battery safety system can detect a minute presence of one or more analytes. In some aspects, the sensor is in communication with a battery management system.

Abstract: Provided are an organic salt represented by Formula 1, a resist composition including the same, and a method of forming a pattern by using the same: A11+B11???Formula 1 wherein, in Formula 1, A11+ is represented by Formula 1A, and B11? is represented by Formula 1B, wherein descriptions of R11 to R13, L21, L22, a21, a22, R21, R22, Rf, b22, c11 and n11 in Formulae 1A and 1B are provided herein.

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition includes a polymer including a first repeating unit repeating unit Formula 1, a photoacid generator, and an organic solvent. In Formula 1, L11 to L13, a11 to a13, A11 to A13, R11 to R14, b12 to b14, and p are the same as described in the detailed description.

Abstract: Disclosed are a polycarboxylate compound represented by Formula 1 below, a resist composition including the same, and a method of forming a pattern using the same. In Formula 1, A11, X11, m11, n11, R13 and b13 are as described in the specification.

Abstract: Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition: A description of Formula 1 is provided herein.

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition: For descriptions of L1, n1, R1, and A+ in Formula 1, refer to those provided herein.

Abstract: A semiconductor device includes a first electrode, a second electrode spaced apart from the first electrode, a dielectric layer between the first electrode and the second electrode and including a metal oxide represented by MaOb, and a leakage current reducing layer on the dielectric layer between the first electrode and the second electrode and including an inorganic compound represented by Alx1Lx2Oy1Xy2, where a, b, M, L, X, x1, x2, y1, and y2 are as described in the description.

Abstract: Provided are a capacitor and an electronic device including the same. The capacitor includes a first electrode layer, a second electrode layer, a dielectric layer disposed between the first electrode layer and the second electrode layer, and an interlayer disposed between the first electrode layer and the dielectric layer. The interlayer includes a first interface material, the first interface material includes at least one Group 13 element, and the at least one Group 13 element is not aluminum (Al).

Abstract: Provided are an image processing method and an input processing device based on a neural network, the method including: obtaining a feature map distinguishing between a near object and a distant object of a low-resolution input image, obtaining a composited weight map for the low-resolution input image by inputting the feature map to a first Deep Neural Network (DNN), obtaining a first image by inputting the low-resolution input image to a second DNN suitable for restoring a distant object, obtaining a second image by inputting the low-resolution input image to a third DNN suitable for restoring a near object, and obtaining a high-resolution image for the low-resolution input image by performing weighted averaging on the first image and the second image using the composited weight map.

Abstract: Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same: wherein X+, Y?, and R11 to R13 in Formula 1 are understood by referring to the specification.

Abstract: An image processing device configured to obtain difference maps between a first frame or a first feature map corresponding to the first frame, and second feature maps corresponding to a second frame, obtain third feature maps and fourth feature maps by performing pooling processes on the difference maps according to a first size and a second size, obtain modified difference maps by weighted-summing the third feature maps and the fourth feature maps, identify any one collocated sample based on sizes of sample values of collocated samples of the modified difference maps corresponding to a current sample of the first frame, and determine a filter kernel used to obtain the second feature map corresponding to the modified difference map including the identified collocated sample, as a motion vector of the current sample.

Abstract: A capacitor, a semiconductor device, and an electronic apparatus including the semiconductor device are disclosed. The capacitor includes a first electrode; a second electrode disposed apart from the first electrode; a dielectric film between the first electrode and the second electrode; and a leakage current reducing layer provided on the dielectric film between the first electrode and the second electrode and including MxAlyOz.

Abstract: Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid: In Formulae 1 and 2, R11 to R16, b12, X?, R21 to R24, b22, and Y are as described in the specification.