Patents by Inventor Beon Lee

Beon Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5679164
    Abstract: The present invention relates in general to a metal-organic chemical vapor deposition (MOCVD) apparatus used to grow an epi layer, and more particularly to an auxiliary apparatus for growing MOCVD for uniformly growing an epi layer inside a reaction chamber. The auxiliary apparatus includes a molybdenum cylinder that is used to guide the source gas, an inner barrel located within and spaced from the cylinder, and an axially extending separation plate that divides the cylinder and inner barrel into two portions. A flange attaches the auxiliary apparatus to the reaction chamber.
    Type: Grant
    Filed: December 5, 1995
    Date of Patent: October 21, 1997
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Jong-Hyup Baik, Beon Lee