Abstract: Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

Abstract: Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

Abstract: An optical assembly (222) for directing and/or focusing a beam of light energy for an exposure apparatus (10) includes an optical housing (240) and one or more optical elements (242) that cooperate to form an optical cavity (270) having one or more stagnant flow areas (272). The optical assembly (222) also includes one or more flow diverters (246) for improving the flow a replacement fluid (250) in the stagnant flow areas (272) of the optical cavity (270) during purging of the optical assembly (222) with the replacement fluid (250).

Abstract: An optical assembly (222) for directing and/or focusing a beam of light energy for an exposure apparatus (10) includes an optical housing (240) and one or more optical elements (242) that cooperate to form an optical cavity (270) having one or more stagnant flow areas (272). The optical assembly (222) also includes one or more flow diverters (246) for improving the flow a replacement fluid (250) in the stagnant flow areas (272) of the optical cavity (270) during purging of the optical assembly (222) with the replacement fluid (250).

Abstract: Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

Abstract: A hypocholesterolaemic agent and a process for its preparation by extraction from edible fungi, along with methods of use of the agent for preventing the synthesis of cholesterol in a person. These methods include the administration of the agent alone or in a food or beverage. The foods or beverages that contain this agent are another feature of the invention.

Abstract: An isolated, naturally occurring microorganism which is incapable of producing a toxin and which produces at least one compound which can be ingested by a human to lower serum cholesterol concentrations. The microorganism can be used to prepare an edible product such as a fermented food product or a medicament that includes the at least one compound and that can be safely ingested by the human to reduce serum cholesterol concentrations.

Abstract: Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

Abstract: An optical alignment apparatus and method for a semiconductor lithography mask and wafer utilizes two monochromatic light sources of different wavelengths. The mask contains targets in the form of linear Fresnel zone plates and the wafer contains a reflecting grating. Incident illumination from the two light sources illuminates the mask targets and is reflected from the wafer gratings in various intensity depending on the physical characteristics of the wafer and mask layers and thicknesses and by the targets. A detector detects the strongest of the diffracted return beams from each of the monochromatic light sources and uses the strongest to align the targets and grating on the mask and wafer for more accurate printing of mask patterns on the wafer.

Abstract: An x-ray mask membrane reflection compensator includes an x-ray chamber having a transmitting gaseous media therein chamber through which x-rays are directed to a mask membrane that is positioned in close spaced proximity to a resist-coated wafer. A controlled environment of processing gas is provided within a gap between the mask membrane and wafer surfaces. The processing gas and gaseous media pressures variously cause bulging of the membrane resulting in a descrepancy in the gap distance across the field of view. A laser source provides an incident beam of light which is directed at an incident angle to the mask membrane and the wafer surface such that return beams are reflected and interference fringe patterns, due to slight nonparallelism of the mask membrane and the wafer are displayed on a monitor.

Abstract: The present process makes use of at least two pairs of supplementary marks used for evaluating the relative dimensional distortions of the mask and the wafer, apart from three pairs of alignment marks respectively inscribed on a mask and a wafer disposed in parallel and in proximity relationship. Each pair of marks comprises a Fresnel zone lens and a broken line forming a grating with a constant spacing. Following alignment with the aid of the alignment marks, the supplementary marks are used for determining the amplitude of the distortions. The source - mask distance is adjusted to compensate the linear distortions and the positioning of the mask is adjusted to compensate the non-linear distortions.

Abstract: The invention relates to the alignment of designs in two near planes, whereby one (the mask) carries a design which is to be reproduced on the second (the pattern).The invention relates to a method for the optical alignment of these two planes using a pair of marks formed by a lens (4) having linear Fresnel zones inscribed on the mask (1) and a reflecting grating (3) of appropriate width inscribed on the pattern (2). The illumination by a parallel beam of monochromatic light of the lens with Fresnel zones produces on the pattern a substantially rectangular illumination spot which, when made to coincide with the line inscribed on the pattern is reflected or transmitted, and supplies a detected intensity maximum or minimum depending on whether the lines reflects more or less than the remainder of the pattern. The invention also relates to an optical alignment apparatus for performing this method.