Abstract: A conveyor belt idler assembly comprises support structure, a strand of catenary idler rollers, and an outboard wing roller or slider bar. The strand of catenary idler rollers can take on various trough-shaped contours. The outboard wing roller or slider bar is attached to the support structure and is able to translate relative to the support structure only along a linear path. The translational movement of the outboard wing roller or slider bar along the linear path is at least partial dependent upon changes in the contour of the strand of catenary idler rollers. The structure is adjustable such that the strand of catenary idler rollers can be lowered and raised to facilitate servicing and installation. A plurality of idler assemblies can be connected to each other using connecting brackets that rigidly tie the assemblies to each other near the outermost idler rollers or slider bars.

Abstract: A conveyor belt idler assembly comprises support structure, a strand of catenary idler rollers, and an outboard wing roller or slider bar. The strand of catenary idler rollers can take on various trough-shaped contours. The outboard wing roller or slider bar is attached to the support structure and is able to translate relative to the support structure only along a linear path. The translational movement of the outboard wing roller or slider bar along the linear path is at least partial dependent upon changes in the contour of the strand of catenary idler rollers. The structure is adjustable such that the strand of catenary idler rollers can be lowered and raised to facilitate servicing and installation. A plurality of idler assemblies can be connected to each other using connecting brackets that rigidly tie the assemblies to each other near the outermost idler rollers or slider bars.

Abstract: A system and method for dynamic frequency adjustment for interoperability of differential clock recovery, including one or more of the following: a frequency generator for receiving a frequency reference clock signal and generating a plurality of frequency signals by operating on the frequency reference clock signal, the plurality of frequencies signals being output from the frequency generator and each having a different frequency; a flexible distributor for receiving the plurality of frequency signals from the frequency generator and selecting ones of said plurality of frequency signals and transmitting said selected ones of said plurality of frequency signals; and a plurality of differential units, each for receiving one of said selected ones of said plurality of frequency signals, each for applying a differential signal to said selected ones of said plurality of frequency signals, and each for adding time stamps to the selected ones of said plurality of frequency signals and outputting respective time sta

Abstract: A system and method for dynamic frequency adjustment for interoperability of differential clock recovery, including one or more of the following: a frequency generator for receiving a frequency reference clock signal and generating a plurality of frequency signals by operating on the frequency reference clock signal, the plurality of frequencies signals being output from the frequency generator and each having a different frequency; a flexible distributor for receiving the plurality of frequency signals from the frequency generator and selecting ones of said plurality of frequency signals and transmitting said selected ones of said plurality of frequency signals; and a plurality of differential units, each for receiving one of said selected ones of said plurality of frequency signals, each for applying a differential signal to said selected ones of said plurality of frequency signals, and each for adding time stamps to the selected ones of said plurality of frequency signals and outputting respective time sta

Abstract: A system and method for dynamic frequency adjustment for interoperability of differential clock recovery, comprising: a frequency generator for receiving a frequency reference clock signal and generating a plurality of frequency signals, the plurality of frequency signals being output from the frequency generator and each having a different frequency; a flexible distributor for receiving the plurality of frequency signals from the frequency generator, and transmitting selected frequency signals; and a plurality of differential units, each for receiving the selected frequency signals, applying a differential signal to the selected frequency signals, adding time stamps to the selected frequency signals, and outputting respective time stamped differential selected frequency signals.

Abstract: A clock distribution mechanism for circuit emulation applications, and related method, including one or more of the following: a plurality of digitally controlled oscillators, each of the plurality of digitally controlled oscillators receiving one or more Ethernet packets and generating a recovered clock from the one or more Ethernet packets; a multiplexer for receiving the recovered clocks generated by the plurality of digitally controlled oscillators, selecting a one of the recovered clocks generated by the plurality of digitally controlled oscillators, and outputting the selected one of the recovered clocks; a normalizer that receives a frequency of the selected one of the recovered clocks and generates a normalized frequency output based on the received frequency of the selected one of the recovered clocks and outputs the normalized frequency output; a clock source selector for receiving a plurality of input clock sources, one of the input clock sources being the normalized frequency output of the normali

Abstract: A clock distribution mechanism for circuit emulation applications, and related method, including one or more of the following: a plurality of digitally controlled oscillators, each of the plurality of digitally controlled oscillators receiving one or more Ethernet packets and generating a recovered clock from the one or more Ethernet packets; a multiplexer for receiving the recovered clocks generated by the plurality of digitally controlled oscillators, selecting a one of the recovered clocks generated by the plurality of digitally controlled oscillators, and outputting the selected one of the recovered clocks; a normalizer that receives a frequency of the selected one of the recovered clocks and generates a normalized frequency output based on the received frequency of the selected one of the recovered clocks and outputs the normalized frequency output; a clock source selector for receiving a plurality of input clock sources, one of the input clock sources being the normalized frequency output of the normali

Abstract: A system and method for dynamic frequency adjustment for interoperability of differential clock recovery, including one or more of the following: a frequency generator for receiving a frequency reference clock signal and generating a plurality of frequency signals by operating on the frequency reference clock signal, the plurality of frequencies signals being output from the frequency generator and each having a different frequency; a flexible distributor for receiving the plurality of frequency signals from the frequency generator and selecting ones of said plurality of frequency signals and transmitting said selected ones of said plurality of frequency signals; and a plurality of differential units, each for receiving one of said selected ones of said plurality of frequency signals, each for applying a differential signal to said selected ones of said plurality of frequency signals, and each for adding time stamps to the selected ones of said plurality of frequency signals and outputting respective time sta

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant.

Abstract: This invention relates to an ion beam monitoring arrangement for use in an ion implanter where it is desirable to monitor the flux and/or a cross-sectional profile of the ion beam used for implantation. It is often desirable to measure the flux and/or cross-sectional profile of an ion beam in an ion implanter in order to improve control of ion implantation of a semiconductor wafer or similar. The present invention describes adapting the wafer holder to allow such beam profiling to be performed. The substrate holder may be used progressively to occlude the ion beam from a downstream flux monitor or a flux monitor may be located on the wafer holder that is provided with a slit entrance aperture.

Abstract: This invention relates to a method of implanting ions in a substrate using an ion beam where instabilities in the ion beam may be present and to an ion implanter for use with such a method. This invention also relates to an ion source for generating an ion beam that can be switched off rapidly. In essence, the invention provides a method of implanting ions comprising switching off the ion beam when an instability has been detected whilst continuing motion of the substrate relative to the ion beam to leave an unimplanted portion of a scan line across the substrate, establishing a stable ion beam once more and finishing the scan line by implanting the unimplanted portion of the path.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.