Patents by Inventor Bernard John Roman

Bernard John Roman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming an integrated circuit pattern on a semiconductor substrate using silicon-rich silicon nitride
    Patent number: 5639687
    Abstract: Reflective notching of a photoresist pattern (20), generated over reflective materials on a semiconductor substrate (12), is minimized by using an anti-reflective layer (20) of silicon-rich silicon nitride. The layer of silicon-rich silicon nitride is formed over the reflective materials and a layer of photoresist is then formed over the silicon-rich silicon nitride. The photoresist layer is then photolithographically patterned to form an integrated circuit pattern (20). The silicon-rich silicon nitride layer has an absorptive index of greater than 0.25, which allows it to be used as an anti-reflective layer with photolithographic patterning systems having ultraviolet and deep ultraviolet exposure wavelengths.
    Type: Grant
    Filed: February 23, 1996
    Date of Patent: June 17, 1997
    Assignee: Motorola Inc.
    Inventors: Bernard John Roman, Bich-Yen Nguyen, Chandrasekaram Ramiah