Abstract: The invention relates to a method of manufacturing a spring (10) of the cylindrical type to be used at high temperatures. This spring (10) is made of refractory material, such as quartz, boron nitride or graphite. It is constituted by recesses (11.sub.1 to 11.sub.7) not adjoining each other, having a height h and which are distributed along a helical line. The method of manufacturing utilizes a wire saw for forming these recesses in a cylindrical tube, which is subjected to a rotation after each sawing operation. The absence of microcracks imparts a high elasticity to the spring up to high temperatures. It is used for transmitting movements at high temperatures, more particularly when conditions of perfect cleanliness are desired, as, for example, in the case of semiconductor metallurgy.

Abstract: The invention relates to a crucible for the growth of epitaxial layers of chemical compounds formed from several chemical elements by means of epitaxial growth from the liquid phase comprising an elongated support (72), on which a movable part (73) slides longitudinally, the elongated support comprising at least one recess for accommodating a substrate (76) on which is to be deposited at least one epitaxial layer, the movable part comprising at least one cavity (77) receiving a mother source (79) formed from initial epitaxy materials, the cavity having on the surface adjoining the elongated support a lower opening whose dimensions correspond to the dimensions of the substrate (76) present therein.

Abstract: The invention relates to a crucible for growing epitaxial layers having a chemical composition formed by several chemical elements, of which at least one is volatile, by the method of epitaxy from the liquid phase, comprising an elongated support (72) on which a movable part (73) slides longitudinally, with the elongated support comprising at least one recess for accommodating a substrate (76) on which at least one epitaxial layer is to be deposited. The movable part (73) comprises at least one cavity (77) receiving a mother source (79) formed by initial material for epitaxy with the cavity having on the surface adjoining the elongated support a lower opening whose dimensions correspond to the dimensions of the substrates (76) present therein. At least one receptacle (80) accommodates a source for each volatile element of the chemical composition.