Patents by Inventor Bernard Lloyd HWANG

Bernard Lloyd HWANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrostatic chuck for high temperature processing chamber
    Patent number: 11127620
    Abstract: Implementations of the present disclosure include methods and apparatuses utilized to reduce cracking of the substrate support surface of a high temperature electrostatic chuck within a processing chamber. In one implementation, a high temperature electrostatic chuck has a ceramic body. The ceramic body has a workpiece mounting surface and a bottom surface. A plurality of backside gas channels are formed in the workpiece mounting surface. A chucking mesh disposed in the ceramic body has a main chucking portion spaced a first distance from the workpiece mounting surface and an electrode mounting portion spaced a second distance from the workpiece mounting surface, wherein the second distance is greater than the first distance. An electrode is coupled the electrode mounting portion and is accessible from the bottom surface.
    Type: Grant
    Filed: June 15, 2018
    Date of Patent: September 21, 2021
    Assignee: Applied Materials, Inc.
    Inventor: Bernard Lloyd Hwang
  • ELECTROSTATIC CHUCK FOR HIGH TEMPERATURE PROCESSING CHAMBER
    Publication number: 20180366361
    Abstract: Implementations of the present disclosure include methods and apparatuses utilized to reduce cracking of the substrate support surface of a high temperature electrostatic chuck within a processing chamber. In one implementation, a high temperature electrostatic chuck has a ceramic body. The ceramic body has a workpiece mounting surface and a bottom surface. A plurality of backside gas channels are formed in the workpiece mounting surface. A chucking mesh disposed in the ceramic body has a main chucking portion spaced a first distance from the workpiece mounting surface and an electrode mounting portion spaced a second distance from the workpiece mounting surface, wherein the second distance is greater than the first distance. An electrode is coupled the electrode mounting portion and is accessible from the bottom surface.
    Type: Application
    Filed: June 15, 2018
    Publication date: December 20, 2018
    Inventor: Bernard Lloyd HWANG