Abstract: A process for obtaining a structure having a textured external surface for an organic light-emitting device, which structure includes a mineral glass substrate having a surface which is provided with projections and depressions, the process including the deposition of an etching mask on the surface of the substrate and the etching of the surface of the substrate around the etching mask, and possible removal of the mask, wherein one of the steps of preparing the etching mask consists in forming a multitude of nodules randomly arranged on the surface of the substrate and made of a material possessing no affinity with the glass and wherein, after the etching step, the structure undergoes a moderating step in which the slopes of the projections of submicron height and width obtained by etching are moderated sufficiently to form the thus moderated textured external surface.

Abstract: A carrier substrate, includes a substrate especially having a glass function, transparent at least in the visible and near-infrared ranges and receiving a conducting electrode which is transparent at least in the visible and near-infrared ranges, this electrode carrier substrate being intended to constitute, in combination with functional elements, a solar cell. This carrier substrate is such that: the electrode includes a micromesh made of conducting material having submillimeter-sized openings; and this micromesh is in contact with an at least slightly conducting antireflection coating facing that one of the functional elements with which it is intended to be in contact. An aspect of the present invention also relates to the use of such a carrier substrate as constituent element of a solar cell and to a process for fabricating the substrate.

Abstract: The invention relates to a process for obtaining a hydrophobic coating on a substrate, preferably consisting of a glass material, a ceramic or a glass-ceramic, said process being characterized in that it comprises: a) a first deposition step, consisting in applying a primer first layer essentially consisting of the silicon oxycarbide SiOxCy type on said substrate, said primer layer having an RMS surface roughness of greater than 4 nm; b) an activation step, in which said SiOxCy primer layer is activated by a plasma of a gas chosen from the noble gases of the Ar or He type and the gases N2, O2 or H2O or by a plasma of a mixture of these gases; and c) a second deposition step, in which a hydrophobic coating comprising at least one fluorocompound, preferably a fluoroalkylsilane, is deposited on said first layer. The invention also relates to hydrophobic glazing comprising or formed by a substrate as defined above, this glazing being in particular used as glazing for transport vehicles or for buildings.

Abstract: A method of manufacturing a submillimetric electroconductive grid coated with an overgrid on a substrate includes: the production of a mask having submillimetric openings by the deposition of a solution of colloidal polymeric nanoparticles that are stabilized and dispersed in a solvent, the polymeric particles having a glass transition temperature Tg and the drying of the masking layer at a temperature below the Tg until the mask, with straight edges, is obtained, the formation of the electroconductive grid by a deposition of electroconductive material, referred to as grid material, a heat treatment of the masking layer with the grid material at a temperature greater than or equal to 0.

Abstract: The manufacture of a submillimetric grid includes the production of a mask having submillimetric openings, referred to as a network mask, on the main face, from a solution of colloidal nanoparticles with a given glass transition temperature Tg, the drying of the masking layer at a temperature below the Tg; the formation of the electroconductive grid from the network mask including in this order: deposition of at least one electroconductive material, referred to as grid material, having an electricity resistivity of less than 10?5 ohm.cm; removal of the masking layer, revealing the mother grid; optional deposition, by electrodeposition, of an electroconductive material, referred to as overgrid material, the surface subjacent to the mother grid then being dielectric; a detachment, of the mother grid or the overgrid, of a thickness of at least 500 nm. The invention also relates to the detached grid.

Abstract: A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a first solution of colloidal nanoparticles in a first solvent is deposited, the particles having a given glass transition temperature Tg, the drying of the masking layer, known as the first masking layer, is carried out at a temperature below said temperature Tg until a mask having a two-dimensional network of substantially straight-edged submillimetric openings, that defines a mask zone known as a network mask zone is obtained, a solid mask zone is formed by a liquid deposition, on the face, of a second masking zone, the solid mask zone being adjacent to and in contact with the network mask zone, and/or at least one cover zone is formed, the cover zone being in contact with the network mask zone, and/or after the drying of the first masking layer, a filled mask zone is formed by filling, via a liquid route, openings of a portion of the network mask zone.

Abstract: A process for manufacturing a mask having submillimetric openings, in which: for a masking layer, a solution of colloidal nanoparticles that are stabilized and dispersed in a first solvent is deposited, the particles having a given glass transition temperature Tg, the drying of the masking layer is carried out at a temperature below the temperature Tg until a mask having a two-dimensional network of submillimetric openings is obtained with substantially straight mask area edges, in a zone referred to as a network mask zone, a zone free of masking is formed on the face by mechanical and/or optical removal of at least one peripheral portion of the network mask zone. The invention also relates to the network mask and the grid with an electroconductive solid zone that are thus obtained.

Abstract: The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff.

Abstract: The subject of the invention is a mirror, especially a front-face mirror and/or a mirror for concentrating solar energy, comprising a material, which mirror comprises a substrate coated with a multilayer comprising at least one silver layer and at least one protective layer located on top of said at least one silver layer, at least one protective layer being characterized in that at least one of its physicochemical characteristics varies with the distance from the substrate.

Abstract: The invention relates to a transparent glass substrate, associated with a transparent electro-conductive layer capable of constituting an electrode of a photovoltaic cell and composed of a doped oxide, characterized by the interposition, between the glass substrate and the transparent electroconductive layer, of a mixed layer of one or more first nitride(s) or oxynitride(s), or oxide(s) or oxycarbide(s) having good adhesive properties with glass, and one or more second nitride(s) or oxynitride(s) or oxide(s) or oxycarbide(s) capable of constituting, possibly in the doped state, a transparent electroconductive layer; a method for producing this substrate; a photovoltaic cell, a tempered and/or curved glass, a shaped heating glass, a plasma screen and a flat lamp electrode having this substrate.

Abstract: Surface texturing process, i.e. one for the formation of at least one array of features with a characteristic dimension on at least one surface portion of a substrate having a glass function, characterized in that a solution containing at least one precursor of a material to be deposited is dissociated, at atmospheric pressure, within a flame, said flame being directed toward said surface portion so as to deposit, in the form of a plurality of nodules based on said material, a mask, said mask of said material being subjected to an etching step.

Abstract: A process for manufacturing a mask having submillimetric openings on a surface portion of a substrate, characterized in that: a layer known as a mask layer is deposited from a solution of colloidal particles that are stabilized and dispersed in a solvent; and the drying of the mask layer is carried out until a two-dimensional irregular network of substantially straight-edged interstices that gives a mask is obtained, with a random mesh of interstices in at least one direction. Submillimetric grid obtained by the process.

Abstract: The subject of the invention is the use of a material composed of a substrate equipped with a coating based on titanium oxide surmounted by a thin hydrophilic layer forming at least one part of the outer surface of said material and that is not composed of titanium oxide, as a material that prevents the deposition of mineral soiling on said outer surface in the absence of water runoff.