Abstract: The invention relates to a skin care article exhibiting a scrub cleaning effect by friction and comprising at least one first and one second external layer made of a fibrous material. The inventive article is characterised in that the first layer (10, 10?, 10?) forms an absorbing cushion and substantially consists of low-micronaire cellulose fibres, in particular less than 8, and the second layer (20, 20?, 20?) is substentially consists of high-micronaire fibres, in particular of micronaire higher than 8, said layers being selected from the following materials: flax, ramie, sisal, jute and hemp separate or mixed.

Abstract: Method for the scanning confocal light-optical microscopic and in-depth examination of an extended field and devices for implementing said method. The method consists of forming a principal luminous beam made up of a plurality of secondary luminous beams distinguished from each other by means of at least one of their characteristics, directing the principal luminous beam towards focussing means (30), focussing onto an object to be examined by means of the focussing means (30) at points of different altitude the various secondary luminous beams, sending back the secondary luminous beams reflected by the object to be examined towards a detection system (20), detecting the intensity of the secondary beams, digitally analyzing and processing the signals detected, and of carrying out a scanning of the principal luminous beam as regards all of the object to be studied.Application for microelectronics inspection.

Abstract: An optical microlithography apparatus with a local alignment system is applicable to the production of integrated circuits. The local alignment system comprises a beam splitter between the photoreduction lens and the integrated circuit wafer, a sighting lens, an illumination source and an alignment pattern in the focal plane of the sighting lens. The source illuminates an area of the wafer around the position finding mark associated with each integrated circuit. The image of said mark is reflected into the focal plane of the sighting lens. A means then displaces the wafer in order to bring about coincidence between the image of the position finding mark and the alignment pattern.

Abstract: The invention relates to an apparatus for measuring the wave surface distortions introduced by a lens, comprising a source which emits coherent light of frequency .nu.o; means for creating a reference beam and a measuring beam; a Bragg cell receiving and transmitting said beams, excited by a radio-frequency wave of frequency f emitted by a generator, the reference beam transmitted having the frequency .nu.o and the measuring beam diffracted by the cell having a frequency .nu.o+f; means for transmitting the beams from the cell to the lens to be tested; detection means transforming the light signal from the lens into an electrical signal of frequency f and whereof the phase is characteristic of the wave surface distortions introduced by the lens; and means for measuring the phase displacement between the phase of the electrical signal from the detection means and the phase of an electrical signal corresponding to the radio-frequency waves.

Abstract: Curled non-woven material formed of waves such as contiguous anti-nodes (9,10) of adjacent waves consist of small adjacent pads (11,12) located on the same side of the median plan (8) of the non-woven material.Use: Medical and surgical compressesFIG. 3.