Patents by Inventor Bernardus Antonius Slaghekke

Bernardus Antonius Slaghekke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 10527955
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 10466595
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: November 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190227444
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: March 29, 2019
    Publication date: July 25, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob STREEFKERK, Johannes Catharinus Hubertus MULKENS, Erik Theodorus Maria BIJLAART, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Bernardus Antonius SLAGHEKKE, Patricius Aloysius Jacobus TINNEMANS, Helmar VAN SANTEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 10248034
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180046089
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: October 23, 2017
    Publication date: February 15, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Henrikus Herman Marie COX, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Joeri LOF, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEDLEN, Johannes Catharinus Hubertus MULKENS, Gerardus Petrus Matthijs VAN NUNEN, Klaus SIMON, Bernardus Antonius SLAGHEKKE, Alexander STRAAIJER, Jan-Gerard Cornelis VAN DER TOORN, Martijn HOUKES
  • Lithographic apparatus and device manufacturing method
    Patent number: 9798246
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170045830
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: October 28, 2016
    Publication date: February 16, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob STREEFKERK, Johannes Catharinus Hubertus MULKENS, Erik Theodorus Maria BIJLAART, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Bernardus Antonius SLAGHEKKE, Patricius Aloysius Jacobus TINNEMANS, Helmar VAN SANTEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 9494869
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: November 15, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • Lithographic apparatus and device manufacturing method
    Patent number: 9482962
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: November 1, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 9477160
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: February 17, 2015
    Date of Patent: October 25, 2016
    Assignee: ASML NETHERLAND B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160299440
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: June 16, 2016
    Publication date: October 13, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Henrikus Herman Marie COX, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Joeri LOF, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Johannes Catharinus Hubertus MULKENS, Gerardus Petrus Matthijs VAN NUNEN, Klaus SIMON, Bernardus Antonius SLAGHEKKE, Alexander STRAAIJER, Jan-Gerard Cornelis VAN DER TOORN, Martijn HOUKES
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150168850
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: February 17, 2015
    Publication date: June 18, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Mattijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Lithographic apparatus and device manufacturing method
    Patent number: 8964164
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: February 24, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140375972
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Application
    Filed: September 9, 2014
    Publication date: December 25, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140340666
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Application
    Filed: December 5, 2012
    Publication date: November 20, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Marie Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • Lithographic apparatus and device manufacturing method
    Patent number: 8860923
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: October 14, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 8724083
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: April 7, 2011
    Date of Patent: May 13, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Mattijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Lithographic apparatus and device manufacturing method
    Patent number: 8724084
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: May 13, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Mattijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Lithographic apparatus
    Patent number: 8638418
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: January 28, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 8542344
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: September 24, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen