Patents by Inventor Bernd E. E. Kastenmeier

Bernd E. E. Kastenmeier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090004865
    Abstract: A method for treating an edge portion of a wafer with a plasma or select chemical formulation in order to enhance adhesion characteristics and inhibit delamination of a layer of material from the wafer surface only on the edge portion that is being treated. Alternatively, the method may be utilized to effectuate a cleaning of an edge portion of a wafer.
    Type: Application
    Filed: June 29, 2007
    Publication date: January 1, 2009
    Inventors: Bernd E. E. Kastenmeier, Andreas Knorr
  • Patent number: 6613484
    Abstract: A method for maintaining critical dimension during the etching of dielectrics, having the following steps: depositing a layer of photoresist over a layer of dielectric; patterning the photoresist such that voids are formed in the photoresist, the voids having sidewalls and a bottom; depositing an overlayer in an etch chamber; transferring the patterning in the photoresist to the dielectric.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: September 2, 2003
    Assignee: International Business Machines Corporation
    Inventors: Timothy J. Dalton, Bernd E. E. Kastenmeier, Theodorus E. Standaert
  • Publication number: 20030116533
    Abstract: A method for maintaining critical dimension during the etching of dielectrics, having the following steps:
    Type: Application
    Filed: December 20, 2001
    Publication date: June 26, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Timothy H. Dalton, Bernd E. E. Kastenmeier, Theodorus E. Standaert