Patents by Inventor Bernd Küchler

Bernd Küchler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for improving a simulation model of photolithographic projection
    Patent number: 7207030
    Abstract: A method is provided for improving a photolithographic simulation model of the photolithographic simulation of a pattern formed on a photomask. Proceeding from a two-dimensional simulation model that takes account of the physical-chemical processes during lithography, a frequency-dependent intensity loss is calculated which is determined by multiplication of the simulated intensity distribution in the Fourier space by a filter function. An accurate calculation of the intensity distribution in the substrate plane is obtained. This method achieves the accuracy of three-dimensional models with a significantly shorter processing duration and is further suitable in particular for the calculation of OPC structures.
    Type: Grant
    Filed: November 24, 2004
    Date of Patent: April 17, 2007
    Assignee: Infineon Technologies AG
    Inventors: Bernd Küchler, Ralf Ziebold, Christoph Nölscher
  • Method for improving a simulation model of photolithographic projection
    Publication number: 20050114823
    Abstract: A method is provided for improving a photolithographic simulation model of the photolithographic simulation of a pattern formed on a photomask. Proceeding from a two-dimensional simulation model that takes account of the physical-chemical processes during lithography, a frequency-dependent intensity loss is calculated which is determined by multiplication of the simulated intensity distribution in the Fourier space by a filter function. An accurate calculation of the intensity distribution in the substrate plane is obtained. This method achieves the accuracy of three-dimensional models with a significantly shorter processing duration and is further suitable in particular for the calculation of OPC structures.
    Type: Application
    Filed: November 24, 2004
    Publication date: May 26, 2005
    Inventors: Bernd Kuchler, Ralf Ziebold, Christoph Nolscher