Patents by Inventor Bernd Matthiesen

Bernd Matthiesen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4994141
    Abstract: The invention relates to a method of manufacturing a mask support (diaphragm) of SiC for radiation lithography masks, in which an SiC layer is deposited at least on one of the two major surfaces of a substrate in the form of a silicon single crystal wafer and the silicon single crystal wafer is removed except at an edge region by means of a selective etching step, the mask support being annealed before or after the selective etching step in an oxidizing atmosphere at a temperature in the range of 200.degree. to 1350.degree. C. for a duration of 2 to 10 h.
    Type: Grant
    Filed: December 4, 1989
    Date of Patent: February 19, 1991
    Assignee: U.S. Philips Corporation
    Inventors: Margret Harms, Holger Luthje, Bernd Matthiesen