Patents by Inventor Bernd Peter Geh

Bernd Peter Geh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate edge detection
    Patent number: 10607873
    Abstract: A method including directing, by an optical system, an illumination beam to a surface of a substrate, providing relative motion between the directed illumination beam and the substrate until the directed illumination beam is illuminated on a grating underneath an edge or a notch of the substrate, diffracting, by the grating, at least a portion of the illumination beam, and detecting, by the detector, the diffracted illumination.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: March 31, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Eric Anthony Janda, Cayetano Sánchez-Fabrés Cobaleda, Bernd Peter Geh, Simon Gijsbert Josephus Mathijssen
  • SUBSTRATE EDGE DETECTION
    Publication number: 20190101839
    Abstract: A method including directing, by an optical system, an illumination beam to a surface of a substrate, providing relative motion between the directed illumination beam and the substrate until the directed illumination beam is illuminated on a grating underneath an edge or a notch of the substrate, diffracting, by the grating, at least a portion of the illumination beam, and detecting, by the detector, the diffracted illumination.
    Type: Application
    Filed: March 23, 2017
    Publication date: April 4, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Eric Anthony JANDA, Cayetano COBALEDA SÁNCHEZ-FABRÉS, Bernd Peter GEH, Simon Gijsbert Josephus MATHIJSSEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 8339574
    Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a linear polarization.
    Type: Grant
    Filed: August 15, 2008
    Date of Patent: December 25, 2012
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Michael Totzeck, Bernd Peter Geh, Skip Miller
  • Lithographic apparatus and device manufacturing method
    Patent number: 7684013
    Abstract: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: March 23, 2010
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Steven George Hansen, Donis George Flagello, Wolfgang Singer, Bernd Peter Geh, Vladan Blahnik
  • Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20080304037
    Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a linear polarization.
    Type: Application
    Filed: August 15, 2008
    Publication date: December 11, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Michael TOTZECK, Bernd Peter Geh, Skip Miller
  • Lithographic apparatus and device manufacturing method
    Patent number: 7423727
    Abstract: A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.
    Type: Grant
    Filed: January 25, 2005
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Michael Totzeck, Bernd Peter Geh, Skip Miller