Patents by Inventor Bernd R. G. Matthiessen

Bernd R. G. Matthiessen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a mask for the production of patterns in lacquer layers by means of X-ray lithography
    Patent number: 4606803
    Abstract: A method of manufacturing a mask for producing patterns in lacquer layers by means of X-ray lithography comprising a diaphragm which is very transparent to the X-ray radiation, is stretched on a frame in a self-supporting manner and which is applied as a thin layer to a substrate in a manner such that it is subjected to tensile stress, while the substrate is then removed as far as a part constituting a frame for the then self-supporting diaphragm.
    Type: Grant
    Filed: October 26, 1984
    Date of Patent: August 19, 1986
    Assignee: U.S. Philips Corporation
    Inventors: Holger K. Luthje, Angelika M. Bruns, Margret Harms, Bernd R. G. Matthiessen