Patents by Inventor Bernd Rau

Bernd Rau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12123246
    Abstract: A method of operating a motorized flap arrangement of a motor vehicle, the flap arrangement including a flap, configured to be swiveled about a swivel axis, a drive arrangement, a drive controller, configured to control the drive arrangement, and a motion sensor arrangement, the sensor values determined by the motion sensor arrangement are checked for fulfillment of a specified actuation criterion, upon which an actuation effect manually exerted on the flap is deemed to be detected and the drive arrangement is controlled by the drive controller for motorized adjustment of the flap. The motion sensor arrangement arranged on a section of the flap facing away from the swivel axis. The actuation criterion is defined in such a way that the actuation criterion is fulfilled by a torque introduced into the flap before exceeding a breakaway torque of the flap kinematics.
    Type: Grant
    Filed: May 17, 2022
    Date of Patent: October 22, 2024
    Assignee: Brose Fahrzeugteile SE & Co. Kommanditgesellschaft, Bamberg
    Inventors: Bernd Herthan, Manfred Stenzel, Daniel Steiner, Maximilian Rau
  • Patent number: 8790498
    Abstract: A method and device for ion beam processing of surfaces of a substrate positions the substrate to face an ion beam, and a new technologically-defined pattern of properties is established. According to the method, the current geometrical effect pattern of the ion beam on the surface of the substrate is adjusted depending on the known pattern of properties and the new technologically-defined pattern of properties, and depending upon the progress of the processing, by modifying the beam characteristic and/or by pulsing the ion beam. A device for carrying out the method includes a substrate support for holding at least one substrate, which can be moved along an Y-axis and an X-axis, and an ion beam source for generating an ion beam, which is perpendicular to the surface to be processed of the substrate in the Z-axis or which may be arranged in an axis, inclined in relation to the Z-axis. The distance between the ion beam source and the surface to be processed of the substrate may be fixed or variable.
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: July 29, 2014
    Assignee: Roth & Rau AG
    Inventors: Joachim Mai, Dietmar Roth, Bernd Rau, Karl-Heinz Dittrich
  • Publication number: 20090242131
    Abstract: The invention relates to an ECR plasma source comprising a coaxial microwave supply line with an internal conductor and an external conductor, wherein the internal conductor with one end as the antenna passes through a vacuum flange in insulated fashion, which vacuum flange closes off an opening in the wall to the plasma space. A multipole magnet arrangement is provided coaxially with respect to the microwave supply line and its magnetic fields pass through the vacuum flange and form an annular-gap magnetic field in the plasma space coaxially with respect to the antenna.
    Type: Application
    Filed: August 8, 2007
    Publication date: October 1, 2009
    Applicant: Roth & Rau AG
    Inventors: Joachim Mai, Valerl Fell, Bernd Rau
  • Publication number: 20080110745
    Abstract: A method and device for ion beam processing of surfaces of a substrate positions the substrate to face an ion beam, and a new technologically-defined pattern of properties is established. According to the method, the current geometrical effect pattern of the ion beam on the surface of the substrate is adjusted depending on the known pattern of properties and the new technologically-defined pattern of properties, and depending upon the progress of the processing, by modifying the beam characteristic and/or by pulsing the ion beam. A device for carrying out the method includes a substrate support for holding at least one substrate, which can be moved along an Y-axis and an X-axis, and an ion beam source for generating an ion beam, which is perpendicular to the surface to be processed of the substrate in the Z-axis or which may be arranged in an axis, inclined in relation to the Z-axis. The distance between the ion beam source and the surface to be processed of the substrate may be fixed or variable.
    Type: Application
    Filed: October 29, 2004
    Publication date: May 15, 2008
    Applicant: ROTH & RAU AG
    Inventors: Joachim Mai, Dietmar Roth, Bernd Rau, Karl-Heinz Dittrich
  • Patent number: 5977214
    Abstract: In the process according to the invention molding compounds based on duroplastic bonding agents are produced thereby that the bonding agents are mixed as a melt with the filler and additive substances. Curing is achieved thereby that the temperature of the mixture during the mixing process increases above the onset temperature of the curing reaction and, after the desired degree of curing has been attained, is suddenly lowered.
    Type: Grant
    Filed: January 20, 1998
    Date of Patent: November 2, 1999
    Assignee: Bakelite AG
    Inventors: Herbert Knorr, Peter Adolphs, Werner Nolte, Bernd Rau, Bernhard Muller, Michael Hermann
  • Patent number: 4731302
    Abstract: Hard coatings for mechanically and corrosively stressed elements are applicable to arbitrarily chosen substrate materials. The mentioned elements can be tools, cutting inserts or bearings. Further, applications are possible in electronics and optics and also for decorative purposes. Hard coatings on the basis of carbon and boron nitride, produced by known techniques, are obtained which can be used in a wide field of application, exhibiting, besides a high hardness, maximum adhesion and good protection against wear and corrosion at high temperatures. The C and B/N coatings consist of amorphous network structures with short range orders similar to that of the hexagonal crystalline phases of carbon and boron nitride, have hydrogen concentrations between 5 atom-% and 50 atom-% and additional components consisting of metals and/or boron and or silicon and/or noble gases in the concentration range between 1 atom-% and 85 atom-%.
    Type: Grant
    Filed: October 6, 1986
    Date of Patent: March 15, 1988
    Assignee: Technische Hochschule Karl-Marx-Stadt
    Inventors: Christian Weissmantel, Bernd Rau, Klaus Bewilogua, Dietmar Roth, Bernd Rother