Patents by Inventor Bernd Rieger

Bernd Rieger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9029767
    Abstract: The invention relates to a method for adjusting a Cs corrector in a STEM using a crystalline sample. The method comprises recording a through-focus series, converting the obtained images to Fourier space, thus forming a set of images alike diffraction images. By then determining the symmetry of the Fourier images, the corrector can be tuned for better symmetry, and the transfer limit can be determined by determining the maximum distance of the spots from the center. By repeatedly performing these steps, the corrector can be tuned to its optimum performance.
    Type: Grant
    Filed: October 19, 2012
    Date of Patent: May 12, 2015
    Assignee: FEI Company
    Inventors: Maarten Bischoff, Bernd Rieger
  • Patent number: 8885973
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: November 11, 2014
    Assignee: FEI Company
    Inventors: Bernd Rieger, Michiel van der Stam
  • Publication number: 20130266240
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Application
    Filed: March 13, 2013
    Publication date: October 10, 2013
    Applicant: FEI Company
    Inventors: Bernd Rieger, Michiel van der Stam
  • Patent number: 8447133
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: May 21, 2013
    Assignee: FEI Company
    Inventors: Bernd Rieger, Michiel Van Der Stam
  • Publication number: 20100246993
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Application
    Filed: December 11, 2009
    Publication date: September 30, 2010
    Applicant: FEI COMPANY
    Inventors: Bernd Rieger, Michiel van der Stam
  • Patent number: 7544939
    Abstract: A lens of particle-optical apparatus, such as the objective lens, suffers from aberrations. As is already known since decades Ronchigrams can be used to determine these aberrations of particle-optical lenses. Such methods rely e.g. on the determination of the 2nd derivative of the aberration function on the basis of local magnification in one or a set of Ronchigrams. Being dependent on the 2nd derivative the mathematics of these methods allow only (infinitesimal) small shifts between the Ronchigrams. However, this implies that e.g. the spatial quantization noise of the camera recording the Ronchigrams results in a large error. These conflicting requirements limit the accuracy and thus the usefulness of the known methods. The invention describes a set of algorithms which result in an improved method to quantify the lens aberration coefficients using a set of Ronchigrams.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: June 9, 2009
    Assignee: FEI Company
    Inventors: Marinus Johannes van der Zande, Christiaan Kok, Bernd Rieger
  • Publication number: 20070125945
    Abstract: A lens of particle-optical apparatus, such as the objective lens, suffers from aberrations. As is already known since decades Ronchigrams can be used to determine these aberrations of particle-optical lenses. Such methods rely e.g. on the determination of the 2nd derivative of the aberration function on the basis of local magnification in one or a set of Ronchigrams. Being dependent on the 2nd derivative the mathematics of these methods allow only (infinitesimal) small shifts between the Ronchigrams. However, this implies that e.g. the spatial quantization noise of the camera recording the Ronchigrams results in a large error. These conflicting requirements limit the accuracy and thus the usefulness of the known methods. The invention describes a set of algorithms which result in an improved method to quantify the lens aberration coefficients using a set of Ronchigrams.
    Type: Application
    Filed: December 5, 2006
    Publication date: June 7, 2007
    Applicant: FEI Company
    Inventors: Marinus van der Zande, Christiaan Kok, Bernd Rieger