Patents by Inventor Bernd Seher

Bernd Seher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7328885
    Abstract: A plasma radiation source is improved in such a way that the lifetime of the optics which is limited by the influence of debris is appreciably increased. A gas curtain through which the radiation proceeding from a source region in a vacuum chamber is emitted at a defined solid angle for debris suppression along an axis of the mean propagation direction of the radiation exits as a radially directed supersonic gas jet from a propulsion nozzle of a gas jet vacuum pump, which propulsion nozzle is arranged on the axis. The gas curtain is directed to an annular mixing nozzle that is arranged coaxial to the axis and is guided out of the vacuum chamber by a diffuser. This makes it possible to use source arrangements having an optimal conversion efficiency but extensive debris.
    Type: Grant
    Filed: August 9, 2004
    Date of Patent: February 12, 2008
    Assignee: XTREME Technologies GmbH
    Inventors: Max C. Schuermann, Bernd Seher, Lutz Mueller, Thomas Missalla
  • Publication number: 20060158126
    Abstract: A plasma radiation source is improved in such a way that the lifetime of the optics which is limited by the influence of debris is appreciably increased. A gas curtain through which the radiation proceeding from a source region in a vacuum chamber is emitted at a defined solid angle for debris suppression along an axis of the mean propagation direction of the radiation exits as a radially directed supersonic gas jet from a propulsion nozzle of a gas jet vacuum pump, which propulsion nozzle is arranged on the axis. The gas curtain is directed to an annular mixing nozzle that is arranged coaxial to the axis and is guided out of the vacuum chamber by a diffuser. This makes it possible to use source arrangements having an optimal conversion efficiency but extensive debris.
    Type: Application
    Filed: August 9, 2004
    Publication date: July 20, 2006
    Inventors: Max Schuermann, Bernd Seher, Lutz Mueller, Thomas Missalla
  • Publication number: 20040062350
    Abstract: In an arrangement for determining the spectral reflectivity of a measurement object, the object of the invention is to provide a simpler and more compact measuring arrangement, to eliminate the removal of elements from the beam path for detecting the reference beam, which was formally necessary, and to avoid complex translational and rotational movements. Different beam areas proceeding from the radiation source serve as measurement beam and reference beam which are directed simultaneously to different spectrally dispersing areas of at least one dispersive element and to different receiver areas of at least one receiver in a spectrograph. Preferred measurement objects are surfaces which reflect in a spectrally-dependent manner for radiation in the extreme ultraviolet range (EUV), but application of the arrangement is not limited to this spectral region.
    Type: Application
    Filed: September 26, 2003
    Publication date: April 1, 2004
    Applicant: JENOPTIK Mikrotechnik GmbH
    Inventors: Max Christian Schuermann, Thomas Missalla, Bernd Seher
  • Patent number: 5535250
    Abstract: A device for manipulating a synchrotron beam bundle is intended to produce properties of the beam bundle, under vacuum conditions, which are adapted to the respective application of deep X-ray lithography, in particular, which are adapted to the scanning regimen. Pairs of diaphragms which are displaceable relative to one another are provided between the object table and an inlet window within a vacuum chamber containing an object table for receiving an object to be irradiated, which object table is adjustable by a scanning movement relative to the synchrotron beam bundle. The pair of diaphragms for which the direction of relative displacement of the diaphragms coincides with the scanning movement is coupled with the scanning movement. Further, a filter chamber is arranged upstream of the vacuum chamber and contains filters which can be inserted into the synchrotron beam bundle.
    Type: Grant
    Filed: January 18, 1995
    Date of Patent: July 9, 1996
    Assignee: Jenoptik Technologie GmbH
    Inventors: Bernd Seher, Frank Reuther, Lutz Mueller
  • Patent number: 5515410
    Abstract: In an irradiation device for deep x-ray lithography the adjustment precision necessary for the irradiation is to be ensured and influences, which act uncontrolled on the adjusted position, substantially eliminated. An object stand is provided which is surrounded by a vacuum chamber, secured to a carrier and is movable with positioning means with respect to a beam and which has a holder suitable not only to receive an article to be irradiated but also to receive an adjusting element. Between the carrier, object stand and positioning means on the one hand and the vacuum chamber on the other hand there is a first isolating, flexible connection and between wall elements, of which one is connected to the carrier and the other is fixed to the frame, there is a second isolating, flexible connection, the surfaces of the two isolating, flexible connections acting against the external air pressure being of the same size.
    Type: Grant
    Filed: February 15, 1995
    Date of Patent: May 7, 1996
    Assignee: Jenoptik Technologie GmbH
    Inventors: Bernd Seher, Rudi Neuland, Frank Reuther
  • Patent number: D877225
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: March 3, 2020
    Assignee: JENOPTIK Optical Systems GmbH
    Inventors: Stefan Franz, Bernd Seher