Abstract: The disclosure relates to microlithography systems, such as EUV micro-lithography illumination systems, as well as related components, systems and methods.

Abstract: An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution of the object field illumination. The latter has an optical component to which the used radiation beam is at least partially applied upstream of the object field and which can be driven in a controlled manner. A detector acquires one of the illumination parameters. An evaluation device evaluates the detector data and converts the latter into control signals. At least one actuator displaces the optical component. During exposures, the actuators are controlled with the aid of the detector signals during the period of a projection exposure. A maximum displacement of below 8 ?m is ensured for edges of the object field towards an object to be exposed.

Abstract: The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

Abstract: An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet.

Abstract: Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection exposure apparatuses provided with such illumination systems, related methods of manufacturing microstructured elements, and microstructured elements obtained by these methods.

Abstract: An optical element includes first regions which reflect or transmit the light falling on the optical element. The optical element also includes second regions which are in each instance separated by a distance from a first region and which at least partially surround a first region. The second regions are designed to be at least in part electrically conductive and are electrically insulated from the first regions. The optical element includes a carrier element and at least two first regions in the form of mirror facets which are arranged on the carrier element. The second regions are arranged with a separation from the mirror facets on the carrier element and are electrically insulated against the carrier element as well as against the mirror facet. At least one mirror facet is surrounded by an electrically conductive second region.

Abstract: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.

Abstract: The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.

Abstract: Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection exposure apparatuses provided with such illumination systems, related methods of manufacturing microstructured elements, and microstructured elements obtained by these methods.

Abstract: A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).

Abstract: Facet mirror having a number of mirror facets A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).

Abstract: A proximity sensor (11) is intended to initiate the warhead of a defence shell which is fired against an attacking projectile from the object to be protected in order to interfere with or even destroy the functionality of the attacker. For that purpose the proximity sensor (11) should not yet respond to the attacker which is to be defended against by the shell appearing ahead in the direction of flight thereof; rather, the proximity sensor is to respond only when the attacker to be defended against is detected ahead inclinedly at an operatively optimal distance. Such a response characteristic in the form of the wall of a hollow cone is afforded if an annular detector element (12) is arranged in the image focus plane behind a positive cylindrical lens (14).

Abstract: A deformable mirror (10) with an at least quasi-continuously deformable optically effective surface (12) has a floatingly supported mirror plate (11) which is positioned along its edge by a portion of the adjusting members (14.1), whereas the other portion of the adjusting members (14.2) locally individually deforms the mirror plate (11) for the purposes of wave front correction. In that respect all adjusting members (14.1, 14.2) are fixed to the rear side (13) of the mirror plate (11), with a coupling portion (11) which is provided with a desired-flexion location (constriction (25)).

Abstract: A deformable mirror (10) with an at least quasi-continuously deformable optically effective surface (12) has a floatingly supported mirror plate (11) which is positioned along its edge by a portion of the adjusting members (14.1), whereas the other portion of the adjusting members (14.2) locally individually deforms the mirror plate (11) for the purposes of wave front correction. In that respect all adjusting members (14.1, 14.2) are fixed to the rear side (13) of the mirror plate (11), with a coupling portion (11) which is provided with a desired-flexion location (constriction (25)).

Abstract: Craft (11) generally and in particular the transport aircraft (11) which are used for humanitarian purposes and for supplying crisis reaction forces over militarily unknown territory and which have comparatively little manoeuverability are particularly endangered by partisans who operate out of cover with modern portable guided missiles (12), against whose homing heads (13) the flares which were previously discharged from aircraft (11) no longer afford an effective defence. Therefore those and other potentially endangered craft (11) are provided with easily interchangeably and autarchically equipped containers (17) from which the defence beam (16) of a laser source (21) in accordance with pre-guidance by a warning sensor (10), are directed by way of the tracking optical system (19) of a target tracking system (20) on to the approaching guided missile (12) whose homing head (13) is already locked on to heat sources such as for example the engines of the craft (11) to be protected.