Abstract: A method of imaging a sample with a charged particle beam device, comprising: determining a first focusing strength of an objective lens of the charged particle beam device, the first focusing strength being adapted to focus a charged particle beam on a first surface region of the sample; determining a first focal subrange of a plurality of focal subranges such that the first focusing strength is within the first focal subrange, wherein the plurality of focal subranges is associated with a set of values of a calibration parameter; determining a first value of the calibration parameter, the first value being associated with the first focal subrange; and imaging the first surface region with the first value.

Abstract: According to an embodiment, a method for automated critical dimension measurement on a substrate for display manufacturing is provided. The method includes scanning a first field of view having a first size with a charged particle beam to obtain a first image having a first resolution of a first portion of the substrate for display manufacturing; determining a pattern within the first image, the pattern having a first position; scanning a second field of view with the charged particle beam to obtain a second image of a second portion of the substrate, the second field of view has a second size smaller than the first size and has a second position provided relative to the first position, the second image has a second resolution higher than the first resolution; and determining a critical dimension of a structure provided on the substrate from the second image.

Abstract: A method for inspecting a sample with a multi-electron beam inspection system (100) is described. The method includes: placing the sample on a movable stage (110) extending in an X-Y-plane; generating a plurality of electron beams (105) propagating toward the sample; focusing the plurality of electron beams on the sample at a plurality of probe positions (106) in a two-dimensional array; scanning the sample surface by moving the movable stage in a predetermined scanning pattern while maintaining the plurality of electron beams stationary; and detecting signal electrons emitted from the sample during the movement of the movable stage for inspecting the sample. Further, a multi-electron beam inspection system (100) for inspecting a sample according to the above method is described.

Abstract: A method of automatically focusing a charged particle beam on a surface region of a sample is provided. The method includes acquiring a plurality of images for a corresponding plurality of focusing strength values; calculating a plurality of sharpness values based on the plurality of images, the plurality of sharpness values are calculated with a sharpness function provided as a sum in a frequency space based on the plurality of images; and determining subsequent focusing strength values of the plurality of focusing strength values with a golden ratio search algorithm based one the calculated sharpness values.

Abstract: A method of automatically focusing a charged particle beam on a surface region of a sample is provided. The method includes acquiring a plurality of images for a corresponding plurality of focusing strength values; calculating a plurality of sharpness values based on the plurality of images, the plurality of sharpness values are calculated with a sharpness function provided as a sum in a frequency space based on the plurality of images; and determining subsequent focusing strength values of the plurality of focusing strength values with a golden ratio search algorithm based one the calculated sharpness values.

Abstract: A method of automatically focusing a charted particle beam on a surface region of a sample is provided. The method includes acquiring a plurality of images for a corresponding plurality of focusing strength values; calculating a plurality of sharpness values based on the plurality of images, the plurality of sharpness values are calculated with a sharpness function provided as a sum in a frequency space based on the plurality of images; and determining subsequent focusing strength values of the plurality of focusing strength values with a golden ratio search algorithm based one the calculated sharpness values.

Abstract: According to an embodiment, a method for automated critical dimension measurement on a substrate for display manufacturing is provided. The method includes scanning a first field of view having a first size with a charged particle beam to obtain a first image having a first resolution of a first portion of the substrate for display manufacturing; determining a pattern within the first image, the pattern having a first position; scanning a second field of view with the charged particle beam to obtain a second image of a second portion of the substrate, the second field of view has a second size smaller than the first size and has a second position provided relative to the first position, the second image has a second resolution higher than the first resolution; and determining a critical dimension of a structure provided on the substrate from the second image.

Abstract: A method of automatically focusing a charged particle beam on a surface region of a sample is provided. The method includes acquiring a plurality of images for a corresponding plurality of focusing strength values; calculating a plurality of sharpness values based on the plurality of images, the plurality of sharpness values are calculated with a sharpness function provided as a sum in a frequency space based on the plurality of images; and determining subsequent focusing strength values of the plurality of focusing strength values with a golden ratio search algorithm based one the calculated sharpness values.

Abstract: A system and method for focusing a scanning electron microscope (SEM) comprise acquiring a first SEM image of a sample using a first focus condition, analyzing the first SEM image to determine contrast change measurements, determining a region of interest based on the contrast change measurements, adjusting the SEM from the first focus condition to a second focus condition based at least in part on the region of interest, wherein the first focus condition differs from the second focus condition, and acquiring a second SEM image of the sample using the second focus condition.

Abstract: A method of inspecting a sample with a charged particle beam device is described. The method comprises arranging the sample on a stage, determining a first focusing strength of an objective lens adapted to focus a charged particle beam on a first surface region of the sample that is arranged at a first distance from the objective lens in a direction of an optical axis, calculating a difference between the first distance and a predetermined working distance based on the determined first focusing strength, adjusting a distance between the first surface region and the objective lens by the calculated difference, and inspecting the first surface region. According to a further aspect, a charged particle beam device configured to be operated according to the above method is described.

Abstract: A method of inspecting a sample with a charged particle beam device is described. The method comprises arranging the sample on a stage, determining a first focusing strength of an objective lens adapted to focus a charged particle beam on a first surface region of the sample that is arranged at a first distance from the objective lens in a direction of an optical axis, calculating a difference between the first distance and a predetermined working distance based on the determined first focusing strength, adjusting a distance between the first surface region and the objective lens by the calculated difference, and inspecting the first surface region. According to a further aspect, a charged particle beam device configured to be operated according to the above method is described.

Abstract: A method of inspecting a sample is described which includes a multilevel structure with a first layer that is arranged above a second layer. The method includes: arranging the sample in a vacuum chamber; directing a primary electron beam onto the sample such that first primary electrons of the primary electron beam are backscattered by the first layer to form first backscattered electrons and second primary electrons of the primary electron beam are backscattered by the second layer to form second backscattered electrons; and detecting signal electrons comprising the first backscattered electrons and the second backscattered electrons for obtaining spatial information on both the first layer and the second layer. Further, an apparatus including one or more electron microscopes for inspecting a sample including a multilevel structure is described.

Abstract: A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.

Abstract: A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.

Abstract: A voltage compensation assembly adapted for apparatus having a prober for contacting the electronic elements on a substrate is described. The voltage compensation assembly includes a controller connected to the prober and adapted for active voltage compensation, and a voltage measuring unit connected to the controller and for measuring a voltage on the substrate.

Abstract: Embodiments of the invention relate to methods and apparatus for minimizing electrostatic discharge in processing and testing systems utilizing large area substrates in the production of flat panel displays, solar panels, and the like. In one embodiment, an apparatus is described. The apparatus includes a testing chamber, a substrate support disposed in the testing chamber, the substrate support having a substrate support surface, a structure disposed in the testing chamber, the structure having a length that spans a width of the substrate support surface, the structure being linearly movable relative to the substrate support, and a brush device having a plurality of conductive bristles coupled to the structure and spaced a distance away from the substrate support surface of the substrate support, the brush device electrically coupling the support surface to ground through the structure.

Abstract: The present invention provides a novel surface engineering strategy that uses biomolecular interactions to immobilize surface modifying ligands on biomaterial architectures. The surface modified compositions resulting from the inventive method are useful in many contexts, including, but not limited to, scaffolds for tissue engineering and as vehicles for site specific drug delivery. In one preferred embodiment, the biomolecular interaction is achieved by using an “anchor-adapter-tag” system, in which an adapter which can interact specifically and with high selectivity with an anchor molecule (present on the biodegradable surface) and a tag (bound to the ligand to be immobilized) simultaneously is used in attaching the ligand to the surface in a manner which is stable in vitro or in vivo.

Abstract: The present invention provides biodegradable polymer nanospheres capable of transporting and releasing therapeutic agents, specifically nucleic acids. In preferred embodiments, a sub-150 nm nanosphere is formed containing nucleic acids. Thereafter, the agent is released from the nanosphere. In one embodiment a biodegradable polymer nanosphere surface has attached to it a targeting moiety. In another embodiment, the biodegradable polymer nanosphere surface has attached to it a masking moiety. In yet another embodiment both targeting and masking moieties are attached to the nanosphere surface.