Abstract: A vertical conveying apparatus is used particularly advantageously in a vertical continuous furnace, for example, in semiconductor production. Since rubbing contacts are avoided and there is thus barely any wear, continuous furnaces provided therewith are particularly suitable for the sensitive semiconductor products and production processes. Since no lateral guides are necessary for the specially designed carriers in the case of relatively small and average stack heights, there is no rubbing contact in the furnace region either, and wear is thus completely avoided. Furthermore, the invention is distinguished by its mechanical simplicity, which has advantages, in particular as far as durability and maintenance are concerned. The absence of retaining or transporting beams in the furnace region makes it possible to achieve a wide variety of different temperature zones over the vertical height of the stack.