Patents by Inventor Bert Henning Freitag
Bert Henning Freitag has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230395351Abstract: A method of imaging a sample includes acquiring one or more first images of a region of the sample at a first imaging condition with a charged particle microscope system. The one or more first images are applied to an input of a trained machine learning model to obtain a predicted image indicating atom structure probability in the region of the sample. An enhanced image indicating atom locations in the region of the sample based on the atom structure probability in the predicted image is caused to be displayed in response to obtaining the predicted image.Type: ApplicationFiled: June 2, 2022Publication date: December 7, 2023Applicant: FEI CompanyInventors: Pavel Potocek, Bert Henning Freitag, Maurice Peemen
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Patent number: 11741730Abstract: Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.Type: GrantFiled: June 24, 2021Date of Patent: August 29, 2023Assignee: FEI CompanyInventors: Pavel Potocek, Maurice Peemen, Bert Henning Freitag
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Publication number: 20230035267Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.Type: ApplicationFiled: October 12, 2022Publication date: February 2, 2023Applicant: FEI CompanyInventors: Pavel POTOCEK, Remco SCHOENMAKERS, Maurice PEEMEN, Bert Henning FREITAG
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Publication number: 20220414361Abstract: Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.Type: ApplicationFiled: June 24, 2021Publication date: December 29, 2022Applicant: FEI CompanyInventors: Pavel POTOCEK, Maurice PEEMEN, Bert Henning FREITAG
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Patent number: 11488800Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.Type: GrantFiled: March 26, 2021Date of Patent: November 1, 2022Assignee: FEI CompanyInventors: Pavel Potocek, Remco Schoenmakers, Maurice Peemen, Bert Henning Freitag
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Publication number: 20220310353Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.Type: ApplicationFiled: March 26, 2021Publication date: September 29, 2022Applicant: FEI CompanyInventors: Pavel POTOCEK, Remco SCHOENMAKERS, Maurice PEEMEN, Bert Henning FREITAG
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Patent number: 11211223Abstract: A method for imaging a sample with charged particles comprises directing charged particles towards the sample along a primary axis, and simultaneously detecting a first portion and a second portion of the charged particles transmitted through the sample with a first detector and a second detector, respectively. The second detector is positioned downstream of the first detector. Each of the transmitted charged particles exits the sample at an exit angle between a direction of the transmitted charged particle and the primary axis. The exit angles of the first portion of the transmitted charged particles overlap with the exit angles of the second portion of the transmitted charged particles. In this way, complimentary information, such as the structural and compositional information, may be obtained simultaneously.Type: GrantFiled: August 25, 2020Date of Patent: December 28, 2021Assignee: FEI CompanyInventors: Ivan Lazić, Stefano Vespucci, Eric Gerardus Bosch, Bert Henning Freitag
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Patent number: 11127562Abstract: Disclosed herein are systems and methods for pulsing electron beams and synchronizing the pulsed electron beam with scanning a sample at a plurality of scan locations. An example method at least includes pulsing an electron beam to form a pulsed electron beam having a pulse period, moving the pulsed electron beam to interact with a sample at a plurality of locations, the interaction at each of the plurality of locations occurring for a dwell time, and synchronizing data acquisition of the interaction of the pulsed electron beam with the sample based on the pulsing and the translating of the electron beam, wherein the dwell time is based on a derivative of the pulse period.Type: GrantFiled: August 5, 2020Date of Patent: September 21, 2021Assignee: FEI CompanyInventors: Erik Rene Kieft, Bert Henning Freitag
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Patent number: 10832901Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: GrantFiled: May 28, 2019Date of Patent: November 10, 2020Assignee: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
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Publication number: 20190341243Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.Type: ApplicationFiled: May 28, 2019Publication date: November 7, 2019Applicant: FEI CompanyInventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
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Patent number: 10224174Abstract: A method, includes, with an illumination system, directing a first charged particle beam along a particle-optical axis to a specimen position, with an imaging system, receiving a second charged particle beam from the specimen position and directing the second charged particle beam to a detector, recording a first output of the detector, varying an excitation of an optical element of the imaging system with a controller so as to rotate the second charged particle beam at the detector through a yaw angle about the particle-optical axis, and recording a second output of the detector at the yaw angle.Type: GrantFiled: November 3, 2017Date of Patent: March 5, 2019Assignee: FEI CompanyInventors: Bert Henning Freitag, Peter Christiaan Tiemeijer, Maarten Bischoff
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Patent number: 8993963Abstract: A detector support for an electron microscope including a detector support ring and flexible elements, wherein a first end of each of the flexible elements is connected to the support ring, and wherein the detector support ring and the flexible elements are configured to support at least two detectors in a circumferential arrangement around an optical axis of the electron microscope such that an optical axis of each of the at least two detectors intersects the optical axis of the electron microscope and a target point of the at least two detectors is maintained relatively constant over a temperature change.Type: GrantFiled: July 7, 2014Date of Patent: March 31, 2015Assignee: FEI CompanyInventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
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Publication number: 20140319347Abstract: A detector support for an electron microscope including a detector support ring and flexible elements, wherein a first end of each of the flexible elements is connected to the support ring, and wherein the detector support ring and the flexible elements are configured to support at least two detectors in a circumferential arrangement around an optical axis of the electron microscope such that an optical axis of each of the at least two detectors intersects the optical axis of the electron microscope and a target point of the at least two detectors is maintained relatively constant over a temperature change.Type: ApplicationFiled: July 7, 2014Publication date: October 30, 2014Inventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
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Patent number: 8859966Abstract: The invention provides multiple detectors that detect electrons that have passed through a sample. The detectors preferably detect electrons after the electrons have been passed through a prism that separates electrons according to their energies. Electrons in different energy ranges are then detected by different detectors, with preferably at least one of the detectors measuring the energy lost by the electrons as they pass through the sample. One embodiment of the invention provides EELS on core-loss electrons while simultaneously providing a bright-field STEM signal from low-loss electrons.Type: GrantFiled: May 12, 2011Date of Patent: October 14, 2014Assignee: FEI CompanyInventors: Peter Christiaan Tiemeijer, Bert Henning Freitag, Sorin Lazar
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Publication number: 20140077080Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.Type: ApplicationFiled: November 26, 2013Publication date: March 20, 2014Applicant: FEI CompanyInventors: Hanno Sebastian Von Harrach, Bert Henning Freitag, Pleun Dona
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Patent number: 8592764Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.Type: GrantFiled: April 2, 2013Date of Patent: November 26, 2013Assignee: FEI CompanyInventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
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Publication number: 20130240731Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.Type: ApplicationFiled: April 2, 2013Publication date: September 19, 2013Applicant: FEI CompanyInventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
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Patent number: 8405027Abstract: A scanning confocal transmission electron microscope includes a descan deflector and a corrector below the sample. The microscope uses a detector that is preferably significantly larger than the resolution of the microscope and is positioned in the real image plane, which provides improved contrast, particularly for light elements.Type: GrantFiled: July 14, 2011Date of Patent: March 26, 2013Assignee: Fei CompanyInventors: Sorin Lazar, Bert Henning Freitag, Peter Christiaan Tiemeijer
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Patent number: 8389936Abstract: The invention describes a method for inspecting samples in an electron microscope. A sample carrier 500 shows electrodes 504, 507 connecting pads 505, 508 with areas A on which the sample is to be placed. After placing the sample on the sample carrier, a conductive pattern is deposited on the sample, so that voltages and currents can be applied to localized parts of the sample. Applying the pattern on the sample may be done with, for example, Beam Induced Deposition or ink-jet printing. The invention also teaches building electronic components, such as resistors, capacitors, inductors and active elements such as FET's in the sample.Type: GrantFiled: July 9, 2010Date of Patent: March 5, 2013Assignee: FEI CompanyInventors: Bert Henning Freitag, Georg Alexander Rosenthal, Daniel Woodrow Phifer, Jr.
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Patent number: 8168948Abstract: The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality TEM samples can be produced.Type: GrantFiled: August 7, 2009Date of Patent: May 1, 2012Assignee: FEI CompanyInventors: Aurélien Philippe Jean Maclou Botman, Bert Henning Freitag, Johannes Jacobus Lambertus Mulders