Patents by Inventor Bert Henning Freitag

Bert Henning Freitag has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230395351
    Abstract: A method of imaging a sample includes acquiring one or more first images of a region of the sample at a first imaging condition with a charged particle microscope system. The one or more first images are applied to an input of a trained machine learning model to obtain a predicted image indicating atom structure probability in the region of the sample. An enhanced image indicating atom locations in the region of the sample based on the atom structure probability in the predicted image is caused to be displayed in response to obtaining the predicted image.
    Type: Application
    Filed: June 2, 2022
    Publication date: December 7, 2023
    Applicant: FEI Company
    Inventors: Pavel Potocek, Bert Henning Freitag, Maurice Peemen
  • Patent number: 11741730
    Abstract: Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: August 29, 2023
    Assignee: FEI Company
    Inventors: Pavel Potocek, Maurice Peemen, Bert Henning Freitag
  • Publication number: 20230035267
    Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.
    Type: Application
    Filed: October 12, 2022
    Publication date: February 2, 2023
    Applicant: FEI Company
    Inventors: Pavel POTOCEK, Remco SCHOENMAKERS, Maurice PEEMEN, Bert Henning FREITAG
  • Publication number: 20220414361
    Abstract: Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.
    Type: Application
    Filed: June 24, 2021
    Publication date: December 29, 2022
    Applicant: FEI Company
    Inventors: Pavel POTOCEK, Maurice PEEMEN, Bert Henning FREITAG
  • Patent number: 11488800
    Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: November 1, 2022
    Assignee: FEI Company
    Inventors: Pavel Potocek, Remco Schoenmakers, Maurice Peemen, Bert Henning Freitag
  • Publication number: 20220310353
    Abstract: Methods for drift corrected, fast, low dose, adaptive sample imaging with a charged particle microscopy system include scanning a surface region of a sample with a charged particle beam to obtain a first image of the surface region with a first detector modality, and then determining a scan strategy for the surface region. The scan strategy comprises a charged particle beam path, a first beam dwell time associated with at least one region of interest in the first image, the first beam dwell time being sufficient to obtain statistically significant data from a second detector modality, and at least a second beam dwell time associated with other regions of the first image, wherein the first beam dwell time is different than the second beam dwell time. The surface region of the sample is then scanned with the determined scan strategy to obtain data from the first and second detector.
    Type: Application
    Filed: March 26, 2021
    Publication date: September 29, 2022
    Applicant: FEI Company
    Inventors: Pavel POTOCEK, Remco SCHOENMAKERS, Maurice PEEMEN, Bert Henning FREITAG
  • Patent number: 11211223
    Abstract: A method for imaging a sample with charged particles comprises directing charged particles towards the sample along a primary axis, and simultaneously detecting a first portion and a second portion of the charged particles transmitted through the sample with a first detector and a second detector, respectively. The second detector is positioned downstream of the first detector. Each of the transmitted charged particles exits the sample at an exit angle between a direction of the transmitted charged particle and the primary axis. The exit angles of the first portion of the transmitted charged particles overlap with the exit angles of the second portion of the transmitted charged particles. In this way, complimentary information, such as the structural and compositional information, may be obtained simultaneously.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: December 28, 2021
    Assignee: FEI Company
    Inventors: Ivan Lazić, Stefano Vespucci, Eric Gerardus Bosch, Bert Henning Freitag
  • Patent number: 11127562
    Abstract: Disclosed herein are systems and methods for pulsing electron beams and synchronizing the pulsed electron beam with scanning a sample at a plurality of scan locations. An example method at least includes pulsing an electron beam to form a pulsed electron beam having a pulse period, moving the pulsed electron beam to interact with a sample at a plurality of locations, the interaction at each of the plurality of locations occurring for a dwell time, and synchronizing data acquisition of the interaction of the pulsed electron beam with the sample based on the pulsing and the translating of the electron beam, wherein the dwell time is based on a derivative of the pulse period.
    Type: Grant
    Filed: August 5, 2020
    Date of Patent: September 21, 2021
    Assignee: FEI Company
    Inventors: Erik Rene Kieft, Bert Henning Freitag
  • Patent number: 10832901
    Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: November 10, 2020
    Assignee: FEI Company
    Inventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
  • Publication number: 20190341243
    Abstract: A method of performing Electron Energy-Loss Spectroscopy (EELS) in an electron microscope, comprising: Producing a beam of electrons from a source; Using an illuminator to direct said beam so as to irradiate the specimen; Using an imaging system to receive a flux of electrons transmitted through the specimen and direct it onto a spectroscopic apparatus comprising: A dispersion device, for dispersing said flux in a dispersion direction so as to form an EELS spectrum; and A detector, comprising a detection surface that is sub-divided into a plurality of detection zones, specifically comprising: Using at least a first detection zone, a second detection zone and a third detection zone to register a plurality of EELS spectral entities; and Reading out said first and said second detection zones whilst said third detection zone is registering one of said plurality of EELS spectral entities.
    Type: Application
    Filed: May 28, 2019
    Publication date: November 7, 2019
    Applicant: FEI Company
    Inventors: Bert Henning Freitag, Sorin Lazar, Stephan Kujawa, Maarten Kuijper, Gerard Nicolaas Anne van Veen, Peter Christiaan Tiemeijer, Jamie McCormack
  • Patent number: 10224174
    Abstract: A method, includes, with an illumination system, directing a first charged particle beam along a particle-optical axis to a specimen position, with an imaging system, receiving a second charged particle beam from the specimen position and directing the second charged particle beam to a detector, recording a first output of the detector, varying an excitation of an optical element of the imaging system with a controller so as to rotate the second charged particle beam at the detector through a yaw angle about the particle-optical axis, and recording a second output of the detector at the yaw angle.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: March 5, 2019
    Assignee: FEI Company
    Inventors: Bert Henning Freitag, Peter Christiaan Tiemeijer, Maarten Bischoff
  • Patent number: 8993963
    Abstract: A detector support for an electron microscope including a detector support ring and flexible elements, wherein a first end of each of the flexible elements is connected to the support ring, and wherein the detector support ring and the flexible elements are configured to support at least two detectors in a circumferential arrangement around an optical axis of the electron microscope such that an optical axis of each of the at least two detectors intersects the optical axis of the electron microscope and a target point of the at least two detectors is maintained relatively constant over a temperature change.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: March 31, 2015
    Assignee: FEI Company
    Inventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
  • Publication number: 20140319347
    Abstract: A detector support for an electron microscope including a detector support ring and flexible elements, wherein a first end of each of the flexible elements is connected to the support ring, and wherein the detector support ring and the flexible elements are configured to support at least two detectors in a circumferential arrangement around an optical axis of the electron microscope such that an optical axis of each of the at least two detectors intersects the optical axis of the electron microscope and a target point of the at least two detectors is maintained relatively constant over a temperature change.
    Type: Application
    Filed: July 7, 2014
    Publication date: October 30, 2014
    Inventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
  • Patent number: 8859966
    Abstract: The invention provides multiple detectors that detect electrons that have passed through a sample. The detectors preferably detect electrons after the electrons have been passed through a prism that separates electrons according to their energies. Electrons in different energy ranges are then detected by different detectors, with preferably at least one of the detectors measuring the energy lost by the electrons as they pass through the sample. One embodiment of the invention provides EELS on core-loss electrons while simultaneously providing a bright-field STEM signal from low-loss electrons.
    Type: Grant
    Filed: May 12, 2011
    Date of Patent: October 14, 2014
    Assignee: FEI Company
    Inventors: Peter Christiaan Tiemeijer, Bert Henning Freitag, Sorin Lazar
  • Publication number: 20140077080
    Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.
    Type: Application
    Filed: November 26, 2013
    Publication date: March 20, 2014
    Applicant: FEI Company
    Inventors: Hanno Sebastian Von Harrach, Bert Henning Freitag, Pleun Dona
  • Patent number: 8592764
    Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.
    Type: Grant
    Filed: April 2, 2013
    Date of Patent: November 26, 2013
    Assignee: FEI Company
    Inventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
  • Publication number: 20130240731
    Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.
    Type: Application
    Filed: April 2, 2013
    Publication date: September 19, 2013
    Applicant: FEI Company
    Inventors: Hanno Sebastian von Harrach, Bert Henning Freitag, Pleun Dona
  • Patent number: 8405027
    Abstract: A scanning confocal transmission electron microscope includes a descan deflector and a corrector below the sample. The microscope uses a detector that is preferably significantly larger than the resolution of the microscope and is positioned in the real image plane, which provides improved contrast, particularly for light elements.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: March 26, 2013
    Assignee: Fei Company
    Inventors: Sorin Lazar, Bert Henning Freitag, Peter Christiaan Tiemeijer
  • Patent number: 8389936
    Abstract: The invention describes a method for inspecting samples in an electron microscope. A sample carrier 500 shows electrodes 504, 507 connecting pads 505, 508 with areas A on which the sample is to be placed. After placing the sample on the sample carrier, a conductive pattern is deposited on the sample, so that voltages and currents can be applied to localized parts of the sample. Applying the pattern on the sample may be done with, for example, Beam Induced Deposition or ink-jet printing. The invention also teaches building electronic components, such as resistors, capacitors, inductors and active elements such as FET's in the sample.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: March 5, 2013
    Assignee: FEI Company
    Inventors: Bert Henning Freitag, Georg Alexander Rosenthal, Daniel Woodrow Phifer, Jr.
  • Patent number: 8168948
    Abstract: The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality TEM samples can be produced.
    Type: Grant
    Filed: August 7, 2009
    Date of Patent: May 1, 2012
    Assignee: FEI Company
    Inventors: Aurélien Philippe Jean Maclou Botman, Bert Henning Freitag, Johannes Jacobus Lambertus Mulders