Patents by Inventor Bert Jan CLAESSENS

Bert Jan CLAESSENS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS
    Publication number: 20110310372
    Abstract: An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
    Type: Application
    Filed: May 24, 2011
    Publication date: December 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bert Jan CLAESSENS, Heine Melle MULDER, Paul VAN DER VEEN, Wilfred Edward ENDENDIJK, Willem Jan BOUMAN, Bert Pieter VAN DRIEËNHUIZEN, Jozef Ferdinand Dymphna VERBEECK, Marc Hendricus Margaretha DASSEN, Thijs Johan Henry HOLLINK
  • Homogenizer
    Publication number: 20110122385
    Abstract: A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation which is output from the first homogenizer stage.
    Type: Application
    Filed: October 21, 2010
    Publication date: May 26, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Bert Jan CLAESSENS, Marcel Mathijs Theodore Marie DIERICHS, Herman Philip GODFRIED
  • LITHOGRAPHIC APPARATUS AND MONITORING METHOD
    Publication number: 20110026001
    Abstract: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.
    Type: Application
    Filed: June 24, 2010
    Publication date: February 3, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bert Jan CLAESSENS, Paul Van Der Veen, Herman Philip Godfried