Patents by Inventor Bert Jan Kampherbeek
Bert Jan Kampherbeek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9105439Abstract: The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.Type: GrantFiled: November 25, 2011Date of Patent: August 11, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Marco Jan Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Van Veen, Pieter Kruit, Stijn Willem Steenbrink
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Patent number: 8890094Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.Type: GrantFiled: September 16, 2013Date of Patent: November 18, 2014Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit, Stijn Willem Herman Karel Steenbrink
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Publication number: 20140014852Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.Type: ApplicationFiled: September 16, 2013Publication date: January 16, 2014Inventors: Marco Jan Jaco WIELAND, Bert Jan KAMPHERBEEK, Alexander Hendrik VAN VEEN, Pieter KRUIT, Stijn Willem STEENBRINK
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Publication number: 20120061583Abstract: The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.Type: ApplicationFiled: November 25, 2011Publication date: March 15, 2012Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco WIELAND, Bert Jan KAMPHERBEEK, Alexander Hendrik VAN VEEN, Pieter KRUIT, Stijn Willem Herman Karel STEENBRINK
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Patent number: 8089056Abstract: A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.Type: GrantFiled: February 26, 2009Date of Patent: January 3, 2012Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Van Veen, Pieter Kruit, Stijn Willem Herman Karel Steenbrink
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Publication number: 20090261267Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses. The projection lens systems are arranged at a pitch in the range of about 1 to 3 times the diameter of the plate apertures, and each projection lens system is for demagnifying and focusing one or more of the charged particle beamlets on to the target plane, each projection lens system has an effective focal length in the range of about 1 to 5 times the pitch, and demagnifies the charged particle beamlets by at least 25 times.Type: ApplicationFiled: February 26, 2009Publication date: October 22, 2009Applicant: MAPPER LITHOGRAPHY IP BVInventors: Marco Jan Jaco WIELAND, Bert Jan KAMPHERBEEK, Alexander Hendrik VAN VEEN, Pieter KRUIT, Stijn Willem Herman Karel STEENBRINK
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Publication number: 20090212229Abstract: A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.Type: ApplicationFiled: February 26, 2009Publication date: August 27, 2009Applicant: MAPPER LITHOGRAPHY IP BVInventors: Marco Jan Jaco WIELAND, Bert Jan KAMPHERBEEK, Alexander Hendrik VAN VEEN, Pieter KRUIT, Stijn Willem Herman Karel STEENBRINK
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Patent number: 7091504Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.Type: GrantFiled: May 12, 2005Date of Patent: August 15, 2006Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent van Veen, Pieter Kruit
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Patent number: 6897458Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optimal system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.Type: GrantFiled: October 30, 2003Date of Patent: May 24, 2005Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent van Veen, Pieter Kruit
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Patent number: 6844560Abstract: A lithography system comprising a converter element (7) for receiving light and converting said light in a plurality of electron beams (15) to be directed towards and focused on a substrate (10) to be processed, said plurality of electron beams (15) being used to define a pattern in a resist layer (20) on said substrate (10), wherein said lithography system is provided with a protective foil with holes at the positions of the electron beams (23) being arranged to protect, in use, said converter element (7) from contamination with material from the resist layer (21).Type: GrantFiled: August 13, 2002Date of Patent: January 18, 2005Assignee: Mapper Lithography IP B.V.Inventors: Marco Wieland, Bert Jan Kampherbeek, Pieter Kruit
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Publication number: 20040141169Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising:Type: ApplicationFiled: October 30, 2003Publication date: July 22, 2004Inventors: Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent van Veen, Pieter Kruit
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Publication number: 20030178583Abstract: The present invention relates to the use of an electron source in a lithography system for producing a plurality of electron beams directed towards an object to be processed, said electron source comprising a plurality of field emitters, characterized in that said electron source comprises a semiconductor layer with a plurality of tips, said use including the steps of:Type: ApplicationFiled: March 18, 2003Publication date: September 25, 2003Inventors: Bert Jan Kampherbeek, Marco Jan-Jaco Wieland, Pieter Kruit
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Publication number: 20030030014Abstract: A lithography system comprising a converter element (7) for receiving light and converting said light in a plurality of electron beams (15) to be directed towards and focused on a substrate (10) to be processed, said plurality of electron beams (15) being used to define a pattern in a resist layer (20) on said substrate (10), wherein said lithography system is provided with a protective foil with holes at the positions of the electron beams (23) being arranged to protect, in use, said converter element (7) from contamination with material from the resist layer (21).Type: ApplicationFiled: August 13, 2002Publication date: February 13, 2003Inventors: Marco Wieland, Bert Jan Kampherbeek, Pieter Kruit
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Patent number: RE44240Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.Type: GrantFiled: August 12, 2008Date of Patent: May 28, 2013Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit
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Patent number: RE44908Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.Type: GrantFiled: January 4, 2012Date of Patent: May 27, 2014Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit
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Patent number: RE45049Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.Type: GrantFiled: January 4, 2012Date of Patent: July 29, 2014Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Bert Jan Kampherbeek, Alexander Hendrik Vincent Van Veen, Pieter Kruit