Patents by Inventor Berthold Reimes

Berthold Reimes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8513080
    Abstract: In sophisticated approaches for forming high-k metal gate electrode structures in an early manufacturing stage, a threshold adjusting semiconductor alloy may be deposited on the basis of a selective epitaxial growth process without affecting the back side of the substrates. Consequently, any negative effects, such as contamination of substrates and process tools, reduced surface quality of the back side and the like, may be suppressed or reduced by providing a mask material and preserving the material at least during the selective epitaxial growth process.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: August 20, 2013
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Stephan Kronholz, Berthold Reimes, Richard Carter, Fernando Koch, Gisela Schammler
  • Publication number: 20120009751
    Abstract: In sophisticated approaches for forming high-k metal gate electrode structures in an early manufacturing stage, a threshold adjusting semiconductor alloy may be deposited on the basis of a selective epitaxial growth process without affecting the back side of the substrates. Consequently, any negative effects, such as contamination of substrates and process tools, reduced surface quality of the back side and the like, may be suppressed or reduced by providing a mask material and preserving the material at least during the selective epitaxial growth process.
    Type: Application
    Filed: September 20, 2011
    Publication date: January 12, 2012
    Inventors: Stephan Kronholz, Berthold Reimes, Richard Carter, Fernando Koch, Gisela Schammler