Patents by Inventor Bertram Bernd BARNICKEL

Bertram Bernd BARNICKEL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Perhydropolysilazane, composition containing same, and method for forming silica film using same
    Patent number: 9793109
    Abstract: [Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane. [Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH1,2 based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: October 17, 2017
    Assignee: AZ Electronic Materials (Luxembourg) S.à.r.l.
    Inventors: Toshiya Okamura, Takashi Kanda, Issei Sakurai, Bertram Bernd Barnickel, Hiroyuki Aoki
  • PERHYDROPOLYSILAZANE, COMPOSITION CONTAINING SAME, AND METHOD FOR FORMING SILICA FILM USING SAME
    Publication number: 20160379817
    Abstract: [Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane. [Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH1,2 based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.
    Type: Application
    Filed: December 8, 2014
    Publication date: December 29, 2016
    Inventors: Toshiya OKAMURA, Takashi KANDA, Issei SAKURAI, Bertram Bernd BARNICKEL, Hiroyuki AOKI