Patents by Inventor Bertram Moeckel

Bertram Moeckel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8409992
    Abstract: A polished semiconductor wafer of high flatness is produced by the following ordered steps: slicing a semiconductor wafer from a rod composed of semiconductor material, material-removal processing of at least one side of the semiconductor wafer, and polishing of at least one side of the semiconductor wafer, wherein the semiconductor wafer has, after the material-removing processing and before the polishing on at least one side to be polished, along its margin, a ring-shaped local elevation having a maximum height of at least 0.1 ?m, wherein the local elevation reaches its maximum height within a 10 mm wide ring lying at the edge of the semiconductor wafer.
    Type: Grant
    Filed: August 4, 2010
    Date of Patent: April 2, 2013
    Assignee: Siltronic AG
    Inventors: Bertram Moeckel, Helmut Franke
  • Publication number: 20110039411
    Abstract: A polished semiconductor wafer of high flatness is produced by the following ordered steps: slicing a semiconductor wafer from a rod composed of semiconductor material, material-removal processing of at least one side of the semiconductor wafer, and polishing of at least one side of the semiconductor wafer, wherein the semiconductor wafer has, after the material-removing processing and before the polishing on at least one side to be polished, along its margin, a ring-shaped local elevation having a maximum height of at least 0.1 ?m, wherein the local elevation reaches its maximum height within a 10 mm wide ring lying at the edge of the semiconductor wafer.
    Type: Application
    Filed: August 4, 2010
    Publication date: February 17, 2011
    Applicant: SILTRONIC AG
    Inventors: Bertram Moeckel, Helmut Franke