Patents by Inventor Bertrand Roessler

Bertrand Roessler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6919107
    Abstract: In a process for treating a surface with the aid of a glow discharge plasma sustained in a gas of substantially ambient pressure between two electrodes (10, 10?) unwanted effects of plasma filaments occurring in such a plasma are prevented by positioning the surface (17) to be treated in an edge region (14?) of the plasma. The surface is placed on one side of a plasma space (14) defined by the electrode faces (11, 11?) beyond a pair of aligned edges (13, 13?) of the electrode faces (11, 11?), at a distance of a few millimeters from these edges (13, 13?), and facing these edges (13, 13?). The treatment gas or treatment gas mixture is fed to the plasma space (14) from a second side opposite the edge region (14?) in which the surface (17) to be treated is positioned. During treatment, a substrate (16) whose one surface (17) is to be treated is either stationary or is advanced in a direction substantially perpendicular to the electrode faces (11, 11?).
    Type: Grant
    Filed: September 17, 2001
    Date of Patent: July 19, 2005
    Assignee: Tetra Pak (Suisse) S.A.
    Inventors: Walter Schwarzenbach, Bertrand Roessler, Pierre Fayet
  • Publication number: 20030185982
    Abstract: In a process for treating a surface with the aid of a glow discharge plasma sustained in a gas of substantially ambient pressure between two electrodes (10, 10′) unwanted effects of plasma filaments occurring in such a plasma are prevented by positioning the surface (17) to be treated in an edge region (14′) of the plasma, i.e. on one side of a plasma space (14) defined by the electrode faces (11, 11′) beyond a pair of aligned edges (13, 13′) of the electrode faces (11, 11′), at a distance of a few millimeters from these edges (13, 13′) and facing these edges (13, 13′). The treatment gas or treatment gas mixture is fed to the plasma space (14) from a second side opposite the edge region (14′) in which the surface (17) to be treated is positioned. During treatment a substrate (16) whose one surface (17) is to be treated is either stationary or is advanced in a direction substantially perpendicular to the electrode faces (11, 11′), e.g.
    Type: Application
    Filed: March 21, 2003
    Publication date: October 2, 2003
    Inventors: Walter Schwarzenbach, Bertrand Roessler, Pierre Fayet