Patents by Inventor Bettina Schiessl

Bettina Schiessl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7063921
    Abstract: The invention relates to a method for the production of masks, in particular for the production of alternating phase shift masks (1), or of chromeless phase shift masks or phase shift masks structured by quartz etching, respectively, as well as to a mask (1), in particular photomask, for the production of semiconductor devices, comprising at least one product field area (6a) and a compensation structure (5) positioned outside the product field area (6a), wherein the compensation structure (5) comprises at least one electroconductive region (8b) that is electrically connected with the product field area (6a).
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: June 20, 2006
    Assignee: Infineon Technologies AG
    Inventors: Wolfgang Dettman, Josef Mathuni, Oliver Fagerer, Bettina Schiessl, Stephen Rahn
  • Publication number: 20040115442
    Abstract: The invention relates to a method for the production of masks, in particular for the production of alternating phase shift masks (1), or of chromeless phase shift masks or phase shift masks structured by quartz etching, respectively, as well as to a mask (1), in particular photomask, for the production of semiconductor devices, comprising at least one product field area (6a) and a compensation structure (5) positioned outside the product field area (6a), wherein the compensation structure (5) comprises at least one electroconductive region (8b) that is electrically connected with the product field area (6a).
    Type: Application
    Filed: September 22, 2003
    Publication date: June 17, 2004
    Inventors: Wolfgang Dettman, Josef Mathuni, Oliver Fagerer, Bettina Schiessl, Stephen Rahn