Patents by Inventor Beverly J. Klemme

Beverly J. Klemme has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Use of coefficient of a power curve to evaluate a semiconductor wafer
    Patent number: 7130055
    Abstract: A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer).
    Type: Grant
    Filed: October 29, 2004
    Date of Patent: October 31, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Peter G. Borden, Regina G. Nijmeijer, Beverly J. Klemme
  • Use of a coefficient of a power curve to evaluate a semiconductor wafer
    Patent number: 6812717
    Abstract: A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer).
    Type: Grant
    Filed: March 5, 2001
    Date of Patent: November 2, 2004
    Assignee: Boxer Cross, Inc
    Inventors: Peter G. Borden, Regina G. Nijmeijer, Beverly J. Klemme
  • Use of coefficient of a power curve to evaluate a semiconductor wafer
    Publication number: 20020167326
    Abstract: A coefficient of a function that relates a measurement from a wafer to a parameter used in making the measurement (such as the power of a beam used in the measurement) is determined. The coefficient is used to evaluate the wafer (e.g. to accept or reject the wafer for further processing), and/or to control fabrication of another wafer. In one embodiment, the coefficient is used to control operation of a wafer processing unit (that may include, e.g. an ion implanter), or a heat treatment unit (such as a rapid thermal annealer).
    Type: Application
    Filed: March 5, 2001
    Publication date: November 14, 2002
    Inventors: Peter G. Borden, Regina G. Nijmeijer, Beverly J. Klemme