Abstract: Implementations of the present disclosure generally relate to an apparatus for reducing particle contamination on substrates in a plasma processing chamber. The apparatus for reduced particle contamination includes a chamber body, a lid coupled to the chamber body. The chamber body and the lid define a processing volume therebetween. The apparatus also includes a substrate support disposed in the processing volume and an edge ring. The edge ring includes an inner lip disposed over a substrate, a top surface connected to the inner lip, a bottom surface opposite the top surface and extending radially outward from the substrate support, and an inner step between the bottom surface and the inner lip. To avoid depositing the particles on the substrate being processed when the plasma is de-energized, the edge ring shifts the high plasma density zone away from the edge area of the substrate.

Abstract: The present disclosure relates to methods and systems for chucking in substrate processing chambers. In one implementation, a method of chucking one or more substrates in a substrate processing chamber includes applying a chucking voltage to a pedestal. A substrate is disposed on a support surface of the pedestal. The method also includes ramping the chucking voltage from the applied voltage, detecting an impedance shift while ramping the chucking voltage, determining a corresponding chucking voltage at which the impedance shift occurs, and determining a refined chucking voltage based on the impedance shift and the corresponding chucking voltage.

Abstract: Embodiments of the present disclosure relate to a method and an apparatus for monitoring plasma behavior inside a plasma processing chamber. In one example, a method for monitoring plasma behavior includes acquiring at least one image of a plasma, and determining a plasma parameter based on the at least one image.

Abstract: A method including providing a graphical user interface including input fields and output fields. The method also can include receiving a total allocation amount for a predetermined time period in an allocation amount input field of the input fields of the graphical user interface, and receiving a performance objective in a performance objective input field of the input fields of the graphical user interface. The method further can include automatically generating an allocation of the total allocation amount among combinations selected from multiple advertisement types and multiple search engines based at least in part on the total allocation amount and the performance objective according to allocation balancing rules, and automatically generating one or more performance forecasts based on the allocation and automatically generating a daily allocation forecast across the predetermined time period based on the allocation.

Abstract: A method and apparatus for operating a plasma processing chamber includes performing a plasma process at a process pressure and a pressure power to generate a plasma. A first ramping-down stage starts in which the process power and the process pressure are ramped down substantially simultaneously to an intermediate power level and an intermediate pressure level, respectively. The intermediate power level and intermediate pressure level are preselected so as to raise a plasma sheath boundary above a threshold height from a surface of a substrate. A purge gas is flowed from a showerhead assembly at a sufficiently high rate to sweep away contaminant particles trapped in the plasma such that one or more contaminant particles move outwardly of an edge of the substrate. A second ramping-down stage starts where the intermediate power level and the intermediate pressure level decline to a zero level and a base pressure, respectively.

Abstract: Implementations described herein generally relate to methods and apparatus for in-situ removal of unwanted deposition buildup from one or more interior surfaces of a semiconductor substrate-processing chamber. In one implementation, the method comprises forming a reactive fluorine species from a fluorine-containing cleaning gas mixture. The method further comprises delivering the reactive fluorine species into a processing volume of a substrate-processing chamber. The processing volume includes one or more aluminum-containing interior surfaces having unwanted deposits formed thereon. The method further comprises permitting the reactive fluorine species to react with the unwanted deposits and aluminum-containing interior surfaces of the substrate-processing chamber to form aluminum fluoride. The method further comprises exposing nitrogen-containing cleaning gas mixture to in-situ plasma to form reactive nitrogen species in the processing volume.

Abstract: Implementations of the present disclosure generally provide improved methods for cleaning a vacuum chamber to remove adsorbed contaminants therefrom prior to a chamber seasoning process while maintaining the chamber at desired deposition processing temperatures. The contaminants may be formed from the reaction of cleaning gases with the chamber components and the walls of the vacuum chamber.

Abstract: A method and apparatus for operating a plasma processing chamber includes performing a plasma process at a process pressure and a pressure power to generate a plasma. A first ramping-down stage starts in which the process power and the process pressure are ramped down substantially simultaneously to an intermediate power level and an intermediate pressure level, respectively. The intermediate power level and intermediate pressure level are preselected so as to raise a plasma sheath boundary above a threshold height from a surface of a substrate. A purge gas is flowed from a showerhead assembly at a sufficiently high rate to sweep away contaminant particles trapped in the plasma such that one or more contaminant particles move outwardly of an edge of the substrate. A second ramping-down stage starts where the intermediate power level and the intermediate pressure level decline to a zero level and a base pressure, respectively.

Abstract: The present disclosure relates to methods and apparatus for reducing particle contamination on substrates in a plasma process chamber. In one embodiment, by applying a DC power to an electrode surrounding a processing region, the boundary of a plasma region formed in the processing region extends closer to the chamber body and outside of the diameter of the substrate support. In another embodiment, by applying a negative bias to an electrode or a positive bias to the lid, negatively charged species located at the boundary of the plasma region are lifted by the electrostatic force created by the negative bias or the positive bias. As a result, species located at the boundary of the plasma region will not fall onto the edge of the substrate disposed on the substrate support as the electric power for sustaining the plasma region is turned off, leading to reduced particle contamination on the substrate.

Abstract: Implementations of the present disclosure generally relate to an apparatus for reducing particle contamination on substrates in a plasma processing chamber. The apparatus for reduced particle contamination includes a chamber body, a lid coupled to the chamber body. The chamber body and the lid define a processing volume therebetween. The apparatus also includes a substrate support disposed in the processing volume and an edge ring. The edge ring includes an inner lip disposed over a substrate, a top surface connected to the inner lip, a bottom surface opposite the top surface and extending radially outward from the substrate support, and an inner step between the bottom surface and the inner lip. To avoid depositing the particles on the substrate being processed when the plasma is de-energized, the edge ring shifts the high plasma density zone away from the edge area of the substrate.

Abstract: Methods and apparatus, including computer program products, are provided for monitoring group location. In some example embodiments, there is provided a method which includes receiving, at a controller, a location of a group of trackers; determining, by the controller, whether to optimize a schedule for the group of trackers as the group of trackers traverses a venue, wherein the determining is based on at least the received location; and sending, by the controller, a message to update the schedule, when the determining indicates the optimization should be performed. Related systems, methods, and articles of manufacture are also described.

Abstract: Embodiments of the present disclosure relate to a method and an apparatus for monitoring plasma behavior inside a plasma processing chamber. In one example, a method for monitoring plasma behavior includes acquiring at least one image of a plasma, and determining a plasma parameter based on the at least one image.

Abstract: Implementations of the present disclosure provide methods for treating a processing chamber. In one implementation, the method includes purging a 300 mm substrate processing chamber, without the presence of a substrate, by flowing a purging gas into the substrate processing chamber at a flow rate of about 0.14 sccm/mm2 to about 0.33 sccm/mm2 and a chamber pressure of about 1 Torr to about 30 Torr, with a throttle valve of a vacuum pump system of the substrate processing chamber in a fully opened position, wherein the purging gas is chemically reactive with deposition residue on exposed surfaces of the substrate processing chamber.

Abstract: Implementations described herein generally relate to methods and apparatus for in-situ removal of unwanted deposition buildup from one or more interior surfaces of a semiconductor substrate-processing chamber. In one implementation, the method comprises forming a reactive fluorine species from a fluorine-containing cleaning gas mixture. The method further comprises delivering the reactive fluorine species into a processing volume of a substrate-processing chamber. The processing volume includes one or more aluminum-containing interior surfaces having unwanted deposits formed thereon. The method further comprises permitting the reactive fluorine species to react with the unwanted deposits and aluminum-containing interior surfaces of the substrate-processing chamber to form aluminum fluoride. The method further comprises exposing nitrogen-containing cleaning gas mixture to in-situ plasma to form reactive nitrogen species in the processing volume.

Abstract: A web-based contact center state engine provides data describing the state of the contact center system and actionable intelligence including key performance indicators. The contact center state engine may be utilized in conjunction with the network monitoring appliance which processes and manages exceptions to the call center data allowing for action, exceptions and escalation, thereby alerting an organization to an issue and providing recommended actions in addition to post event forensic data.

Abstract: A positioning device is described for supporting an infant with myelomeningocele during surgery, transport and pre- and post-operative procedures. The device allows the patient to be expeditiously re-positioned from prone to supine and lateral positions and vice versa before, during and after surgery. The device allows access to the myelomeningocele while the patient is secured in the device.

Abstract: Methods and apparatus, including computer program products, are provided for monitoring group location. In some example embodiments, there is provided a method which includes receiving, at a controller, a location of a group of trackers; determining, by the controller, whether to optimize a schedule for the group of trackers as the group of trackers traverses a venue, wherein the determining is based on at least the received location; and sending, by the controller, a message to update the schedule, when the determining indicates the optimization should be performed. Related systems, methods, and articles of manufacture are also described.

Abstract: A skin graft applicator with a handle member and a roller member is described for use in applying a skin graft to a patient. The skin graft applicator has a manipulator pad for positioning the skin graft, and a roller member for forcing air and fluid from underneath the skin graft ensuring the proper bond between graft and tissue.

Abstract: Novel tools, accessories and methods for fixing a patient's upper and lower jaws together with flexible straps are disclosed. The tools are intended to either allow placement of a flexible strap to bind items to the teeth, or for using a flexible strap to fasten the upper and lower jaw into place, among other purposes. These accessories include a washer with a ratchet head for mounting on a bone screw, a bone screw with integrated ratchet head, dental blocks for use with the bone screws and washers, a flexible strap provided with a dissection tip for forcing the strap through tissue, and combinations thereof, and tools for inserting flexible straps through the gums, among other tools and accessories.

Abstract: A positioning device is described for supporting an infant with myelomeningocele during surgery, transport and pre- and post-operative procedures. The device allows the patient to be expeditiously re-positioned from prone to supine and lateral positions and vice versa before, during and after surgery. The device allows access to the myelomeningocele while the patient is secured in the device.