Patents by Inventor Bhooshan Popere

Bhooshan Popere has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPOSITION FOR PHOTORESIST UNDERLAYER
    Publication number: 20220397827
    Abstract: A photoresist underlayer composition, comprising: a first polymer comprising a crosslinkable group; a second polymer comprising: a first repeating unit comprising a repeating unit comprising a photoacid generator, and a second repeating unit comprising a hydroxy-substituted C1-30 alkyl group, a hydroxy-substituted C3-30 cycloalkyl group, or a hydroxy-substituted C6-30 aryl group; an acid catalyst; and a solvent.
    Type: Application
    Filed: May 28, 2021
    Publication date: December 15, 2022
    Inventors: Jung June Lee, Jae Hwan Sim, Suwoong Kim, Jin Hong Park, Bhooshan Popere
  • PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
    Publication number: 20220091506
    Abstract: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.
    Type: Application
    Filed: August 31, 2021
    Publication date: March 24, 2022
    Inventors: Ke Yang, Emad Aqad, James F. Cameron, Suzanne M. Coley, Manibarsha Goswami, ChoongBong Lee, Bhooshan Popere, James W. Thackeray, Brandon Wenning
  • Silicon-based hardmask
    Patent number: 10818493
    Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.
    Type: Grant
    Filed: December 13, 2018
    Date of Patent: October 27, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Suzanne M. Coley, Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere
  • SILICON-BASED HARDMASK
    Publication number: 20190115209
    Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.
    Type: Application
    Filed: December 13, 2018
    Publication date: April 18, 2019
    Inventors: Suzanne M. Coley, Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere
  • Silicon-based hardmask
    Patent number: 10186424
    Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: January 22, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Suzanne M. Coley, Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere
  • SILICON-BASED HARDMASK
    Publication number: 20180366319
    Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.
    Type: Application
    Filed: June 14, 2017
    Publication date: December 20, 2018
    Inventors: Suzanne M. Coley, Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere